Patents by Inventor Vinaya Kumar Kadayra Basavarajappa

Vinaya Kumar Kadayra Basavarajappa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer-based charged particle accelerator, wafer components, methods, and applications
    Patent number: 10912184
    Abstract: A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: February 2, 2021
    Assignee: Cornell University
    Inventors: Amit Lal, Thomas Schenkel, Arun Persaud, Qing Ji, Peter Seidl, Will Waldron, Serhan Ardanuc, Vinaya Kumar Kadayra Basavarajappa
  • WAFER-BASED CHARGED PARTICLE ACCELERATOR, WAFER COMPONENTS, METHODS, AND APPLICATIONS
    Publication number: 20200187344
    Abstract: A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.
    Type: Application
    Filed: August 12, 2019
    Publication date: June 11, 2020
    Applicant: Cornell University
    Inventors: Amit Lal, Thomas Schenkel, Arun Persaud, Qing Ji, Peter Seidl, Will Waldron, Serhan Ardanuc, Vinaya Kumar Kadayra Basavarajappa
  • Wafer-based charged particle accelerator, wafer components, methods, and applications
    Patent number: 10383205
    Abstract: A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.
    Type: Grant
    Filed: May 4, 2017
    Date of Patent: August 13, 2019
    Assignee: Cornell University
    Inventors: Amit Lal, Thomas Schenkel, Arun Persaud, Qing Ji, Peter Seidl, Will Waldron, Serhan Ardanuc, Vinaya Kumar Kadayra Basavarajappa
  • WAFER-BASED CHARGED PARTICLE ACCELERATOR, WAFER COMPONENTS, METHODS, AND APPLICATIONS
    Publication number: 20190159331
    Abstract: A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.
    Type: Application
    Filed: May 4, 2017
    Publication date: May 23, 2019
    Applicant: CORNELL UNIVERSITY
    Inventors: Amit Lal, Thomas Schenkel, Arun Persaud, Qing JI, Peter Seidl, Will Waldron, Serhan Ardanuc, Vinaya Kumar Kadayra Basavarajappa