Patents by Inventor Vinayak Dattatreya Phalke

Vinayak Dattatreya Phalke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Detection of thin line for selective sensitivity during reticle inspection
    Patent number: 8090189
    Abstract: Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, detection of thin line or sub-resolution assist features may be used for selective sensitivity during photomask inspection. Other embodiments are also described.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: January 3, 2012
    Assignee: KLA-Tencor Corporation
    Inventors: Vinayak Dattatreya Phalke, Ge Cong, Lih-Huah Yiin, Yalin Xiong