Patents by Inventor Vincent Bernard Decaux

Vincent Bernard Decaux has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6855225
    Abstract: A plasma source for use in, for example, semiconductor processing contains a radio-frequency generator, an impedance matching network, and a coil that encloses a tube. The coil is bifilar, i.e., the turns of one are interlaced with the turns of a second winding. The matching network supplies only a single coil in the plasma source, unlike conventional arrangements wherein a single matching network supplies multiple coils in the plasma source.
    Type: Grant
    Filed: January 24, 2003
    Date of Patent: February 15, 2005
    Assignee: Novellus Systems, Inc.
    Inventors: Yuh-Jia Su, David Lee Chen, Vincent Bernard Decaux