Patents by Inventor Vincent G. Leon

Vincent G. Leon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-corrosive cleaning compositions for removing etch residues
    Patent number: 7935665
    Abstract: A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: May 3, 2011
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Vincent G. Leon, Michelle Elderkin, Lawrence Ferreira
  • Non-corrosive cleaning compositions for removing etch residues
    Publication number: 20030235996
    Abstract: A non-corrosive cleaning composition that is aqueous-based, non-hazardous and will not harm the environment and is useful primarily for removing both fresh and aged plasma etch residues from a substrate. The composition comprises (a) water; and (b) a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid. Preferably, the at least one carboxylic acid has a pKa value ranging from 3 to 6. Also, a method for removing etch residues from a substrate. The method includes the steps of (a) providing a substrate with etch residue; and (b) contacting the substrate with a cleaning composition comprising water; and a synergistic combination of at least one tricarboxylic acid and at least one carboxylic acid.
    Type: Application
    Filed: April 24, 2003
    Publication date: December 25, 2003
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Vincent G. Leon, Michelle Elderkin, Lawrence Ferreira
  • Method for removing photoresist and plasma etch residues
    Patent number: 6245155
    Abstract: A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.
    Type: Grant
    Filed: April 6, 1998
    Date of Patent: June 12, 2001
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Vincent G. Leon, Kenji Honda, Eugene F. Rothgery
  • Cleaning composition and method for removing residues
    Patent number: 6191086
    Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: February 20, 2001
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Vincent G. Leon, Kenji Honda, Eugene F. Rothgery
  • Cleaning composition and method for removing residues
    Patent number: 6030932
    Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: February 29, 2000
    Assignee: Olin Microelectronic Chemicals
    Inventors: Vincent G. Leon, Kenji Honda, Eugene F. Rothgery