Patents by Inventor Vincent Kurowski

Vincent Kurowski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8263811
    Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).
    Type: Grant
    Filed: May 6, 2010
    Date of Patent: September 11, 2012
    Assignee: Solvay (Société Anonyme)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Publication number: 20100240850
    Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).
    Type: Application
    Filed: May 6, 2010
    Publication date: September 23, 2010
    Applicant: SOLVAY (SOCIETE ANONYME)
    Inventors: Patrick LACROIX-DESMAZES, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Patent number: 7741524
    Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).
    Type: Grant
    Filed: April 22, 2004
    Date of Patent: June 22, 2010
    Assignee: Solvay (Societe Anonyme)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Patent number: 7285597
    Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.
    Type: Grant
    Filed: March 16, 2007
    Date of Patent: October 23, 2007
    Assignee: Solvay (Societe Anonyme)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Publication number: 20070155929
    Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.
    Type: Application
    Filed: March 16, 2007
    Publication date: July 5, 2007
    Applicant: SOLVAY (SOCIETE ANONYME)
    Inventors: Patrick LACROIX-DESMAZES, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Patent number: 7208558
    Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: April 24, 2007
    Assignee: Solvay (Societe Anonyme)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Publication number: 20070066781
    Abstract: Process for preparing one or more iodinated organic substances having a molecular mass of less than 2000 (substances (S)) using (A) at least one free-radical-generating substance chosen from peroxides, diazo compounds, dialkyldiphenylalkanes, substances derived from tetraphenylethane, boranes and iniferter substances comprising at least one thiuram disulphide group, (B) an ethylenically unsaturated substance capable of adding a free radical to its ethylenic double bond, (C) molecular iodine, which comprises the steps according to which at least a fraction of (A), at least a fraction of (B) and at least a fraction of (C) are introduced into a reactor, and then the contents of the reactor are caused to react, while introducing therein the possible remainder of (A), the possible remainder of (B) and the possible remainder of (C), until a moment is reached when the content of the reactor is a mixture comprising one or more substances (S).
    Type: Application
    Filed: April 22, 2004
    Publication date: March 22, 2007
    Applicant: SOLVAY (SOCIETE ANONYME)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Publication number: 20060205906
    Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn of less than 1.60.
    Type: Application
    Filed: May 11, 2006
    Publication date: September 14, 2006
    Applicant: SOLVAY (SOCIETE ANONYME)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Patent number: 7078473
    Abstract: Radical polymerization process for the preparation of halogenated polymers and block copolymers. Halogenated polymers and block copolymers.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: July 18, 2006
    Assignee: Solvay (Societe Anonyme)
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski
  • Publication number: 20050171312
    Abstract: Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyldiphenylalkanes. Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×104 and an Mz/Mw, ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×104 and a polydispersity index Mw/Mn, of less than 1.60.
    Type: Application
    Filed: May 16, 2003
    Publication date: August 4, 2005
    Inventors: Patrick Lacroix-Desmazes, Romain Severac, Bernard Boutevin, Vincent Bodart, Vincent Kurowski