Patents by Inventor Vincent S. Calia

Vincent S. Calia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6552350
    Abstract: A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: April 22, 2003
    Assignee: Advanced Energy Systems, Inc.
    Inventors: Edwin G. Haas, Robert M Gutowski, Vincent S. Calia
  • Patent number: 6437349
    Abstract: An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).
    Type: Grant
    Filed: June 20, 2000
    Date of Patent: August 20, 2002
    Assignee: Advanced Energy Systems, Inc.
    Inventors: Edwin G. Haas, Robert M. Gutowski, Vincent S. Calia
  • Publication number: 20020051358
    Abstract: A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
    Type: Application
    Filed: January 12, 2001
    Publication date: May 2, 2002
    Applicant: Advanced Energy Systems, Inc.
    Inventors: Edwin G. Haas, Robert M. Gutowski, Vincent S. Calia
  • Patent number: 6190835
    Abstract: A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
    Type: Grant
    Filed: May 6, 1999
    Date of Patent: February 20, 2001
    Assignee: Advanced Energy Systems, Inc.
    Inventors: Edwin G. Haas, Robert M Gutowski, Vincent S. Calia
  • Patent number: 6105885
    Abstract: An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).
    Type: Grant
    Filed: April 3, 1998
    Date of Patent: August 22, 2000
    Assignee: Advanced Energy Systems, Inc.
    Inventors: Edwin G. Haas, Robert M. Gutowski, Vincent S. Calia
  • Patent number: 6065203
    Abstract: A method of fabricating very small diameter deep passages is provided. The method of fabricating very small diameter deep passages may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of the article (200) and the recess (206). An insert (220) may be provided sized to fit the recess (206). An insert passage (230) may be fabricated in the insert (220). The insert (220) may then be secured in the recess (206), with the insert passage (230) and the article passage (216) aligned.
    Type: Grant
    Filed: April 3, 1998
    Date of Patent: May 23, 2000
    Assignee: Advanced Energy Systems, Inc.
    Inventors: Edwin G. Haas, Robert M. Gutowski, Vincent S. Calia
  • Patent number: 4933546
    Abstract: A beam of negatively charged ions is neutralized by impinging jets which dislodge elctrode electrons from the ions. Gas jets are created by orifices circumferentially located around a ring. The symmetrical radial distribution of the orifices does not create a net radial thrust on the ring, which is an important consideration in low-gravity outer space. Further, maximized gas dynamics creates a neutralized beam with a uniform gas density at the exit thereof and an optimized neutralized ion fraction, as compared with the population of ions in the introduced beam.
    Type: Grant
    Filed: August 23, 1988
    Date of Patent: June 12, 1990
    Assignee: Grumman Aerospace Corporation
    Inventors: Eric P. Muntz, John W. Brook, Vincent S. Calia
  • Patent number: 3962694
    Abstract: A method and apparatus for monitoring an electrically actuated tool. The current flowing in the tool circuit is sampled and converted to an analog voltage signal that is proportional to the maximum stress level output of the tool. This converted signal may be displayed and recorded as desired. The converted analog voltage signal is compared with signals representing the current flow that will produce the highest and lowest acceptable stress levels delivered by the tool and a logic control signal is produced if the analog voltage signal is outside the acceptable range. The logic control signal is used to prevent recycling of the tool so that subsequent tool operation is not possible until corrective procedures are instituted. Further, the logic control signal may be used to activate audio and visual indicators. Moreover, the logic control signal can be used to introduce a load into the total circuit to modify the current delivered to the tool and therefore change its output.
    Type: Grant
    Filed: March 6, 1975
    Date of Patent: June 8, 1976
    Assignee: Grumman Aerospace Corporation
    Inventors: Vincent S. Calia, Basil P. Leftheris