Abstract: A method of operating a finite state machine circuit can be provided by determining if a target sequence of characters included in a string of reference characters occurs within a specified difference distance using states indicated by the finite state machine circuit to indicate a number of character mis-matches between the target sequence of characters and a respective sequence of characters within the string of reference characters.

Abstract: A method of operating a finite state machine circuit can be provided by determining if a target sequence of characters included in a string of reference characters occurs within a specified difference distance using states indicated by the finite state machine circuit to indicate a number of character mis-matches between the target sequence of characters and a respective sequence of characters within the string of reference characters.

Abstract: A device for detecting exposure to light includes: a photo-responsive layer including a photochromic material; a skin-mimicking cover layer covering a first side of the photo-responsive layer; and an adhesive layer configured to couple a second side of the photo-responsive layer opposite the first side to a surface.

Abstract: A device for detecting exposure to light includes: a photo-responsive layer including a photochromic material; a skin-mimicking cover layer covering a first side of the photo-responsive layer; and an adhesive layer configured to couple a second side of the photo-responsive layer opposite the first side to a surface.

Abstract: A method of operating a finite state machine circuit can be provided by determining if a target sequence of characters included in a string of reference characters occurs within a specified difference distance using states indicated by the finite state machine circuit to indicate a number of character mis-matches between the target sequence of characters and a respective sequence of characters within the string of reference characters.

Abstract: A device for detecting exposure to light includes: a photo-responsive layer including a photochromic material; a skin-mimicking cover layer covering a first side of the photo-responsive layer; and an adhesive layer configured to couple a second side of the photo-responsive layer opposite the first side to a surface.

Abstract: A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.

Abstract: A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.

Abstract: A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.

Abstract: A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.