Patents by Inventor Vinvent Yu

Vinvent Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus and method for photolithography process
    Patent number: 8098364
    Abstract: Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: January 17, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Vinvent Yu, Hsien-Cheng Wang, Hung-Chang Hsieh