Patents by Inventor Viren V. S. Rana

Viren V. S. Rana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for improving film stability of halogen-doped silicon oxide films
    Patent number: 6090167
    Abstract: A method and apparatus for improving film stability of a halogen-doped silicon oxide layer. The method includes the step of introducing helium along with the process gas that includes silicon, oxygen and a halogen element. Helium is introduced at an increased rate to stabilize the deposited layer. In a preferred embodiment, the halogen-doped film is a fluorosilicate glass film and TEOS is employed as a source of silicon in the process gas. In still another preferred embodiment, SiF.sub.4 is employed as the fluorine source for the FSG film.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: July 18, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Mohan Krishan Bhan, Sudhakar Subrahmanyam, Anand Gupta, Viren V. S. Rana
  • Method and apparatus for improving film stability of halogen-doped silicon oxide films
    Patent number: 6001728
    Abstract: A method and apparatus for improving film stability of a halogen-doped silicon oxide layer. The method includes the step of introducing helium along with the process gas that includes silicon, oxygen and a halogen element. Helium is introduced at an increased rate to stabilize the deposited layer. In a preferred embodiment, the halogen-doped film is a fluorosilicate glass film and TEOS is employed as a source of silicon in the process gas. In still another preferred embodiment, SiF.sub.4 is employed as the fluorine source for the FSG film.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: December 14, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Mohan Krishan Bhan, Sudhakar Subrahmanyam, Anand Gupta, Viren V. S. Rana