Patents by Inventor Virgil Simon Speriosu

Virgil Simon Speriosu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6239955
    Abstract: The back end of an MR sensor and a flux guide are joined by a contiguous self-aligned junction so that a predictable overlap of the flux guide on the back end of the MR sensor can be achieved for optimizing signal flux density in the MR sensor. Lead/longitudinal bias layers for the MR sensor are also joined by a contiguous selfaligned junction to the flux guide for stabilizing the flux guide. By employing a single lift off resist mask the MR sensor and the lead/longitudinal bias layers can be patterned followed by deposition of the flux guide. The flux guide is a bilayer of an insulation material layer and a flux guide material layer. The insulation material layer is sandwiched between the MR sensor and the flux guide material layer and between the lead/longitudinal bias layers and the flux guide material layer. A heat guide or combined flux guide and heat guide may be substituted for the aforementioned flux guide.
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: May 29, 2001
    Assignee: International Business Machines Corporation
    Inventors: Moris Musa Dovek, Robert E. Fontana, Richard Hsiao, Mohamad Towfik Krounbi, Hugo Alberto Emilio Santini, Virgil Simon Speriosu
  • Patent number: 6181532
    Abstract: The back end of an MR sensor and a flux guide are joined by a contiguous self-aligned junction so that a predictable overlap of the flux guide on the back end of the MR sensor can be achieved for optimizing signal flux density in the MR sensor. Lead/longitudinal bias layers for the MR sensor are also joined by a contiguous self-aligned junction to the flux guide for stabilizing the flux guide. By employing a single lift off resist mask the MR sensor and the lead/longitudinal bias layers can be patterned followed by deposition of the flux guide. The flux guide is a bilayer of an insulation material layer and a flux guide material layer. The insulation material layer is sandwiched between the MR sensor and the flux guide material layer and between the lead/longitudinal bias layers and the flux guide material layer. A heat guide or combined flux guide and heat guide may be substituted for the aforementioned flux guide.
    Type: Grant
    Filed: March 30, 1999
    Date of Patent: January 30, 2001
    Assignee: International Business Machines Corporation
    Inventors: Moris Musa Dovek, Robert E. Fontana, Richard Hsiao, Mohamad Towfik Krounbi, Hugo Alberto Emilio Santini, Virgil Simon Speriosu
  • Patent number: 5974657
    Abstract: A method is provided for resetting the magnetization of the pinned and hard biasing layers of a spin valve read head at the row level. In a first embodiment of the invention a first magnetic field is applied substantially perpendicular to the air bearing surface (ABS) at room temperature for setting the magnetic moment of the pinned layer substantially perpendicular to the ABS followed by applying a second magnetic field substantially parallel to the ABS for setting the magnetic moments of the hard biasing layers substantially parallel to the ABS. In a second embodiment of the invention the antiferromagnetic pinning layer is also reset. This is done by heating the pinning layer with a current pulse conducted through the leads to the conductive layers of the spin valve head so that localized heating takes place adjacent the pinning layer as contrasted to ambient heating of the spin valve head.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: November 2, 1999
    Assignee: International Business Machines Corporation
    Inventors: Ciaran Fox, Hardayal Singh Gill, Virgil Simon Speriosu, Jila Tabib
  • Patent number: 5930084
    Abstract: The back end of an MR sensor and a flux guide are joined by a contiguous self-aligned junction so that a predictable overlap of the flux guide on the back end of the MR sensor can be achieved for optimizing signal flux density in the MR sensor. Lead/longitudinal bias layers for the MR sensor are also joined by a contiguous self-aligned junction to the flux guide for stabilizing the flux guide. By employing a single lift off resist mask the MR sensor and the lead/longitudinal bias layers can be patterned followed by deposition of the flux guide. The flux guide is a bilayer of an insulation material layer and a flux guide material layer. The insulation material layer is sandwiched between the MR sensor and the flux guide material layer and between the lead/longitudinal bias layers and the flux guide material layer. A heat guide or combined flux guide and heat guide may be substituted for the aforementioned flux guide.
    Type: Grant
    Filed: June 17, 1996
    Date of Patent: July 27, 1999
    Assignee: International Business Machines Corporation
    Inventors: Moris Musa Dovek, Robert E. Fontana, Richard Hsiao, Mohamad Towfik Krounbi, Hugo Alberto Emilio Santini, Virgil Simon Speriosu
  • Patent number: 5893981
    Abstract: The back end of an MR sensor and a flux guide are joined by a contiguous self-aligned junction so that a predictable overlap of the flux guide on the back end of the MR sensor can be achieved for optimizing signal flux density in the MR sensor. Lead/longitudinal bias layers for the MR sensor are also joined by a contiguous self-aligned junction to the flux guide for stabilizing the flux guide. By employing a single lift off resist mask the MR sensor and the lead/longitudinal bias layers can be patterned followed by deposition of the flux guide. The flux guide is a bilayer of an insulation material layer and a flux guide material layer. The insulation material layer is sandwiched between the MR sensor and the flux guide material layer and between the lead/longitudinal bias layers and the flux guide material layer. A heat guide or combined flux guide and heat guide may be substituted for the aforementioned flux guide.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: April 13, 1999
    Assignee: International Business Machines Corporation
    Inventors: Moris Musa Dovek, Robert E. Fontana, Richard Hsiao, Mohamad Towfik Krounbi, Hugo Alberto Emilio Santini, Virgil Simon Speriosu
  • Patent number: 5856617
    Abstract: An atomic force microscope (AFM) uses a spin valve magnetoresistive strain gauge formed on the AFM cantilever to detect deflection of the cantilever. The spin valve strain gauge operates in the absence of an applied magnetic field. The spin valve strain gauge is formed on the AFM cantilever as a plurality of films, one of which is a free ferromagnetic layer that has nonzero magnetostriction and whose magnetic moment is free to rotate in the presence of an applied magnetic field. In the presence of an applied stress to the free ferromagnetic layer due to deflection of the cantilever, an angular displacement of the magnetic moment of the free ferromagnetic layer occurs, which results in a change in the electrical resistance of the spin valve strain gauge. Electrical resistance detection circuitry coupled to the spin valve strain gauge is used to determine cantilever deflection.
    Type: Grant
    Filed: September 2, 1997
    Date of Patent: January 5, 1999
    Assignee: International Business Machines Corporation
    Inventors: Bruce Alvin Gurney, Harry Jonathon Mamin, Daniel Rugar, Virgil Simon Speriosu
  • Patent number: 5828530
    Abstract: An orthogonal spin valve read head is provided wherein a spin valve sensor is asymmetrically located between first and second shield layers so that image currents in the first and second shield layers produce a resultant image field which partially or completely counterbalances a stiffening field from antiferromagnetic, pinned and spacer layers in the MR sensor when sense current is conducted therethrough. Accordingly, the spin valve sensor may be located a greater distance from the second shield layer by providing a mid-gap layer between the spin valve sensor and a second gap layer. In one example, the total thickness of the mid-gap and second gap layer is four times as thick as the first gap layer which results in the image fields from the first and second shield layers completely counterbalancing the field from the antiferromagnetic, pinned and spacer layers due to the sense current.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: October 27, 1998
    Assignee: International Business Machines Corporation
    Inventors: Hardayal Singh Gill, Bruce A. Gurney, Joseph Francis Smyth, Virgil Simon Speriosu, Douglas Johnson Werner
  • Patent number: 5701223
    Abstract: A spin valve magnetoresistive (SVMR) sensor uses a laminated antiparallel (AP) pinned layer in combination with an improved antiferromagnetic (AF) exchange biasing layer. The pinned layer comprises two ferromagnetic films separated by a nonmagnetic coupling film such that the magnetizations of the two ferromagnetic films are strongly coupled together antiferromagnetically in an antiparallel orientation. This laminated AP pinned layer is magnetically rigid in the small field excitations required to rotate the SVMR sensor's free layer. When the magnetic moments of the two ferromagnetic layers in this AP pinned layer are nearly the same, the net magnetic moment of the pinned layer is small. However, the exchange field is correspondingly large because it is inversely proportional to the net magnetic moment. The laminated AP pinned layer has its magnetization fixed or pinned by an AF material that is highly corrosion resistant but that has an exchange anisotropy too low to be usable in conventional SVMR sensors.
    Type: Grant
    Filed: August 23, 1996
    Date of Patent: December 23, 1997
    Assignee: International Business Machines Corporation
    Inventors: Robert Edward Fontana, Jr., Bruce Alvin Gurney, Tsann Lin, Virgil Simon Speriosu, Ching Hwa Tsang, Dennis Richard Wilhoit
  • Patent number: 5696656
    Abstract: An orthogonal spin valve read head is provided wherein a spin valve sensor is asymmetrically located between first and second shield layers so that image currents in the first and second shield layers produce a resultant image field which partially or completely counterbalances a stiffening field from antiferromagnetic, pinned and spacer layers in the MR sensor when sense current is conducted therethrough. Accordingly, the spin valve sensor may be located a greater distance from the second shield layer by providing a mid-gap layer between the spin valve sensor and a second gap layer. In one example, the total thickness of the mid-gap and second gap layer is four times as thick as the first gap layer which results in the image fields from the first and second shield layers completely counterbalancing the field from the antiferromagnetic, pinned and spacer layers due to the sense current.
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: December 9, 1997
    Assignee: International Business Machines Corporation
    Inventors: Hardayal Singh Gill, Bruce A. Gurney, Joseph Francis Smyth, Virgil Simon Speriosu, Douglas Johnson Werner
  • Patent number: 5650887
    Abstract: Sensors based on the giant magnetoresistance effect, specifically "spin valve" (SV) magnetoresistive sensors, have applications as external magnetic field sensors and as read heads in magnetic recording systems, such as rigid disk drives. These sensors have a ferromagnetic layer whose magnetization orientation is fixed or pinned by being exchange coupled to an antiferromagnetic layer. The magnetization of the pinned layer will become misaligned and the sensor will experience an abnormal response to the field being sensed, i.e., the external magnetic field or the recorded data in the magnetic media, if an adverse event elevates the antiferromagnetic layer above its blocking temperature. A pinned layer mangetization reset system is incorporated into systems that use SV sensors.
    Type: Grant
    Filed: February 26, 1996
    Date of Patent: July 22, 1997
    Assignee: International Business Machines Corporation
    Inventors: Moris Musa Dovek, Bruce Alvin Gurney, Virgil Simon Speriosu