Patents by Inventor Vish Ramanathan

Vish Ramanathan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220367175
    Abstract: A system and method for removing both carbon-based contaminants and oxygen-based contaminants from a semiconductor substrate within a single process chamber is disclosed. The invention may comprise utilization of remote plasma units and multiple gas sources to perform the process within the single process chamber.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 17, 2022
    Inventors: Xing Lin, Peipei Gao, Fei Wang, John Tolle, Bubesh Babu Jotheeswaran, Vish Ramanathan, Eric Hill
  • Publication number: 20190019670
    Abstract: A system and method for removing both carbon-based contaminants and oxygen-based contaminants from a semiconductor substrate within a single process chamber is disclosed. The invention may comprise utilization of remote plasma units and multiple gas sources to perform the process within the single process chamber.
    Type: Application
    Filed: June 5, 2018
    Publication date: January 17, 2019
    Inventors: Xing Lin, Peipei Gao, Fei Wang, John Tolle, Bubesh Babu Jotheeswaran, Vish Ramanathan, Eric Hill