Patents by Inventor Vito TOMASELLO

Vito TOMASELLO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10459345
    Abstract: A method to improve a lithographic process of processing a portion of a design layout onto a substrate using a lithographic apparatus, the method including: adjusting a first processing parameter among processing parameters of the lithographic process to cause the processing to be more tolerant to perturbations of at least one of the processing parameters during processing; and adjusting a second processing parameter among processing parameters of the lithographic process to cause the processing to be more tolerant to perturbations of at least one of the processing parameters during processing.
    Type: Grant
    Filed: February 23, 2016
    Date of Patent: October 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Hunsche, Chiou-Hung Jang, Marinus Jochemsen, Vito Tomasello
  • Publication number: 20180074413
    Abstract: A method to improve a lithographic process of processing a portion of a design layout onto a substrate using a lithographic apparatus, the method including: adjusting a first processing parameter among processing parameters of the lithographic process to cause the processing to be more tolerant to perturbations of at least one of the processing parameters during processing; and adjusting a second processing parameter among processing parameters of the lithographic process to cause the processing to be more tolerant to perturbations of at least one of the processing parameters during processing.
    Type: Application
    Filed: February 23, 2016
    Publication date: March 15, 2018
    Inventors: Stefan HUNSCHE, Chiou-Hung JANG, Marinus JOCHEMSEN, Vito TOMASELLO