Abstract: According to one or more embodiments of the disclosure, a method comprises: forming a first recess for a bit line contact structure of a semiconductor device; providing a liner on a surface of the first recess; etching the linear to open at least part of a bottom of the liner, forming a second recess under the first recess; performing an epitaxial growth process through the second recess; and providing a conductive material to the first and second recesses to form at least part of the bit line contact structure.

Abstract: Devices and techniques are generally described for inference reduction in natural language processing using semantic similarity-based caching. In various examples, first automatic speech recognition (ASR) data representing a first natural language input may be determined. A cache may be searched using the first ASR data. A first skill associated with the first ASR data may be determined from the cache. In some examples, first intent data representing a semantic interpretation of the first natural language input data may be determined by using a first natural language process associated with the first skill.

Abstract: Methods, systems, and devices for contact foot wet pullback with liner wet punch are described. A first etching operation may be performed on a stack of materials and a first insulative material to form a plurality of segments including contacts, the contacts formed from a first conductive material of the stack of materials and extending at least partially through the first insulative material. A first liner material may be deposited over the segments and the first insulative material, and a directional gas bias operation may be performed to transform a portion of the first liner material in contact with an extension of the contacts into a second liner material. A second etching operation may be performed to remove the second liner material and expose a surface of the extension, and a third etching operation may be performed remove at least a portion of the extension.

Abstract: According to an aspect, a method includes receiving an availability resource from a first computing device associated with a studio entity, where the availability resource includes information about a media content item to be available on a media platform. The method includes storing the information of the availability resource in a database and receiving a package submission from a second computing device associated with a post-production house (PPH) entity, where the package submission includes media manifest core (MMC) data and one or more media assets associated with the media content item. The method includes executing a plurality of processing operations, including an error operation, on the package submission, using the availability resource and/or the MMC data, and, in response to determining that the error operation has resulted in an error, transmitting an error notification to the first computing device and/or the second computing device.

Abstract: A method used in forming memory circuitry comprises forming transistors individually comprising one source/drain region and another source/drain region. A channel region is between the one and the another source/drain regions. A conductive gate is operatively proximate the channel region. Openings are formed through insulative material that is directly above the transistors and into the another source/drain regions. Individual of the openings are directly above individual of the another source/drain regions. A laterally-outer insulator material is formed in the individual openings within and below the insulative material. A laterally-inner insulator material is formed in the individual openings within and below the insulative material laterally-over the laterally-outer insulator material. The laterally-outer insulator material and the laterally-inner insulator material are directly against one another and have an interface there-between.

Abstract: A variety of applications can include an apparatus having a memory device in which, during fabrication of the memory device, processing a dielectric isolation region about an active area of a memory cell is controlled to provide enhanced electric isolation of a data line contact to the memory cell with respect to a cell contact to the memory cell. A portion of the dielectric isolation region can be recessed, creating a corner between the dielectric isolation region and a conductive region, where the conductive region is material for the active area. The corner can be filled with a dielectric material and the data line contact can be formed contacting the dielectric material and coupled to the conductive region. The cell contact can be formed to the memory cell contacting the dielectric material such that the dielectric material is between the cell contact and the data line contact.

Abstract: Described herein is a method for encapsulating single cells using alternating current electrospray technology in tip streaming mode. The encapsulation efficiency is over 80% and natural (alginate, collagen) and synthetic (NorHA) hydrogels and various cell types can be used. The encapsulated cells can be implanted and are protected from the host's immune response. In addition, the coating allows better tissue growth in laboratory cell cultures with a conformal mechanical support that allows molecular and nutrient transport.

Abstract: Techniques for masking images based on a particular task are described. A system masks portions of an image that are not relevant to a particular task, thus, reducing the amount of data used by applications for image processing tasks. For example, images to be processed using a hair color classification model are masked so that only portions that show the person's hair are available for the model to analyze. The system configures different masker components to mask images for different tasks. A masker component can be implemented at a user device to mask images prior to sending to an application/task-specific model.

Abstract: Methods, apparatuses, and systems related to a digit line and cell contact are described. An example apparatus includes a semiconductor structure comprising a first layer comprising a first material on sidewalls of a plurality of patterned material. The apparatus further includes a second layer comprising a nitride material on sidewalls of the first layer. The apparatus further includes a third layer comprising the first material on sidewalls of the second layer. The apparatus further includes a base area, to provide digit line and cell contact isolation for the semiconductor structure. The apparatus further includes an active area, adjacent to the base area, that is adjacent to the semiconductor structure.

Abstract: Devices and techniques are generally described for inference reduction in natural language processing using semantic similarity-based caching. In various examples, first automatic speech recognition (ASR) data representing a first natural language input may be determined. A cache may be searched using the first ASR data. A first skill associated with the first ASR data may be determined from the cache. In some examples, first intent data representing a semantic interpretation of the first natural language input data may be determined by using a first natural language process associated with the first skill.

Abstract: A system can operate a speech-controlled device to perform active speaker detection to detect an utterance using image data showing a user speaking the utterance. This enables the device to perform utterance detection using the image data and/or determine which user is speaking the utterance. To perform active speaker detection, the device processes the image data to determine expression parameters associated with the user's face and generates facial measurements based on the expression parameters. For example, the device can use the expression parameters to generate a 3D model including an agnostic facial representation and determine a mouth aspect ratio by measuring a mouth height and a mouth width of the agnostic facial representation. As the mouth aspect ratio changes when the user is speaking, the device can determine that the user is speaking and/or detect an utterance based on an amount of variation of the mouth aspect ratio.

Abstract: An apparatus comprising active areas and shallow trench isolation structures on a base material. A first conductive material is vertically adjacent to an active area of the active areas and between laterally adjacent shallow trench isolation structures. A second conductive material is vertically adjacent to the first conductive material and between the laterally adjacent shallow trench isolation structures. A silicon carbide material is on sidewalls of the shallow trench isolation structures and exhibits substantially vertical sidewalls. An oxide material is adjacent to the active areas and shallow trench isolation structures, a nitride material is adjacent to the oxide material, and a digit line is adjacent to the second conductive material. An electronic system and methods of forming an apparatus are also disclosed.

Abstract: A method of forming a semiconductor device comprising forming a silicon carbide material on a patterned material. The silicon carbide material is subjected to a plasma to expose horizontal portions of the silicon carbide material to the plasma. The horizontal portions of the silicon carbide material are selectively removed, and the patterned material is removed to form a pattern of the silicon carbide material.

Abstract: Techniques for masking images based on a particular task are described. A system masks portions of an image that are not relevant to a particular task, thus, reducing the amount of data used by applications for image processing tasks. For example, images to be processed using a hair color classification model are masked so that only portions that show the person's hair are available for the model to analyze. The system configures different masker components to mask images for different tasks. A masker component can be implemented at a user device to mask images prior to sending to an application/task-specific model.

Abstract: Devices and techniques are generally described for inference reduction in natural language processing using semantic similarity-based caching. In various examples, first automatic speech recognition (ASR) data representing a first natural language input may be determined. A cache may be searched using the first ASR data. A first skill associated with the first ASR data may be determined from the cache. In some examples, first intent data representing a semantic interpretation of the first natural language input data may be determined by using a first natural language process associated with the first skill.

Abstract: A write lock request for a data object on behalf of a first data accessor is received at a lock manager. The data object is currently locked on behalf of a second data accessor. The lock manager modifies lock metadata associated with the data object to indicate the first data accessor as the primary lock owner, and designates the second data accessor as a non-primary owner.

Abstract: Devices and techniques are generally described for three dimensional mesh generation. In various examples, first two-dimensional (2D) image data representing a human may be received. In various further examples, bounding box data identifying a location of the human in the first 2D image data and joint data identifying locations of joints of the human may be received. Second 2D image data representing a cropped portion of the human may be generated using the bounding box data and the joint data. A three-dimensional (3D) mesh prediction model may be used to determine a pose, a shape, and a projection matrix for the human. The 3D mesh prediction model may be used to determine a transformed projection matrix for the portion of the human represented in the second 2D image data.

Abstract: Techniques for masking images based on a particular task are described. A system masks portions of an image that are not relevant to a particular task, thus, reducing the amount of data used by applications for image processing tasks. For example, images to be processed using a hair color classification model are masked so that only portions that show the person's hair are available for the model to analyze. The system configures different masker components to mask images for different tasks. A masker component can be implemented at a user device to mask images prior to sending to an application/task-specific model.

Abstract: An example method includes patterning a working surface of a semiconductor wafer. The example method includes performing a first deposition of a dielectric material in high aspect ratio trenches. The example method further includes performing a high pressure, high temperature vapor etch to recess the dielectric material in the trenches and performing a second deposition of the dielectric material to continue filling the trenches.

Abstract: Techniques for masking images based on a particular task are described. A system masks portions of an image that are not relevant to a particular task, thus, reducing the amount of data used by applications for image processing tasks. For example, images to be processed using a hair color classification model are masked so that only portions that show the person's hair are available for the model to analyze. The system configures different masker components to mask images for different tasks. A masker component can be implemented at a user device to mask images prior to sending to an application/task-specific model.