Abstract: The nanoparticle production device includes a target provided with a nanoparticle source surface, and a magnetron generating a first magnetic field, the target being mounted on the magnetron and the first magnetic field forming field lines at the level of the nanoparticle source surface. The device further includes balancing means of the first magnetic field at the level of the target, arranged to close fleeing field lines of the first magnetic field and to keep said lines closed at the level of said nanoparticle source surface, said balancing means being distinct from the magnetron.

Abstract: A process designed to prevent deposition of polarized contaminating particles on the surface of a micro-component consists, according to the invention, in sputtering a beam of particles between the contamination source and the micro-component. At least a part of the particles of the beam has an opposite polarity from that of the contaminating particles. The beam of particles is preferably a plasma and is designed to drag the contaminating particles away from the free surface of the micro-component to a collecting element. The invention also relates to a micro-component storage device and a thin layer deposition device respectively implementing such a process.

Abstract: Process for producing a magnetic head with an appropriately oriented easy axis of magnetization and head obtained by this process.According to the invention, a large magnetic pattern (52) is formed around a spacer and then said pattern is etched in order to give it the desired shape. In the narrow horizontal branch, the easy axis of magnetization is oriented parallel to the air gap.Application to magnetic recording.