Abstract: A measurement apparatus (1) for measuring a shape of a surface (2) of a test object (3), in particular an optical surface (2) by interferometry, has: an illumination device (4) with an illumination source (5) for generating an illumination wave (6), an interferometer device (7) with a splitting element (8) for splitting the illumination wave into a test wave (9) directed at the surface (2) and into a reference wave (10), and for combining the returning test wave (9), having interacted with the surface to be measured, with the reference wave (10), a registration device (11) for registering and evaluating an interference pattern to determine a deviation of the measured surface shape from a target shape, and a control device (12) configured to split the surface (2) to be measured into a plurality of individual areas (13) to be measured.

Abstract: A method for creating a second series of individual images with a first series of individual images, the individual images of the first or the second series of individual images having been captured with an objective, includes determining the entrance pupil and the field of vision of the objective for the individual images of the first series and creating or adapting the individual images of the second series in accordance with the entrance pupil and the field of vision of the objective of the individual image in question of the first series.

Abstract: A method for creating a second series of individual images with a first series of individual images, the individual images of the first or the second series of individual images having been captured with an objective, includes determining the entrance pupil and the field of vision of the objective for the individual images of the first series and creating or adapting the individual images of the second series in accordance with the entrance pupil and the field of vision of the objective of the individual image in question of the first series.

Abstract: An objective lens for a still or film camera includes a first and second lens-element arrangement, and a wavefront manipulator. The first and second lens-element arrangement are spaced mutually apart along an optical axis of the lens such that an interstice is present therebetween. The wavefront manipulator is in the interstice and includes two optical components displaceable counter to one another, perpendicular to the optical axis, and which each include a free-form surface. The wavefront manipulator has a zero position, wherein the optical components do not cause any image aberrations in the imaging properties of the objective lens, and effective positions, wherein the optical components are displaced counter to one another, out of the zero position perpendicular to the optical axis, and wherein the optical components cause a spherical aberration in the imaging properties of the objective lens.

Abstract: A supplementary lens system for providing at least one supplementary lens in front of a camera module of an electronic device, the supplementary lens system including an object-side lens-element unit with positive refractive power and an image-side lens-element unit with positive refractive power. The object-side lens-element unit and the image-side lens-element unit are configured to generate an intermediate image between the object-side lens-element unit and the image-side lens-element unit. Furthermore, the invention relates to a supplementary lens for such a supplementary lens system.

Abstract: A system includes a microlithography projection objective configured to image radiation from an object plane to an image plane along a radiation path. The microlithography projection objective has an optical axis. The microlithography projection objective includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes an optical element. During use of the system, a liquid is present. The system is configured so that, during use of the system, a distance between the optical element and the image plane is varied to reduce at least one aberration induced by a change in a temperature in the system.

Abstract: A supplementary lens system for providing at least one supplementary lens in front of a camera module of an electronic device, the supplementary lens system including an object-side lens-element unit with positive refractive power and an image-side lens-element unit with positive refractive power. The object-side lens-element unit and the image-side lens-element unit are configured to generate an intermediate image between the object-side lens-element unit and the image-side lens-element unit. Furthermore, the invention relates to a supplementary lens for such a supplementary lens system.

Abstract: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

Abstract: A lens for a still or film camera includes a first and second lens-element arrangement, and a wavefront manipulator. The first and second lens-element arrangement are arranged spaced mutually apart along an optical axis of the lens such that an interstice is present therebetween. The wavefront manipulator is situated in the interstice and includes at least two optical components which are arranged so as to be displaceable counter to one another, perpendicular to the optical axis, and which each include a free-form surface. The wavefront manipulator has a zero position, in which the optical components thereof do not cause any image aberrations in the imaging properties of the lens, and effective positions, in which the optical components are displaced counter to one another, out of the zero position perpendicular to the optical axis, and in which the optical components cause a spherical aberration in the imaging properties of the lens.

Abstract: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

Abstract: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

Abstract: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.

Abstract: The disclosure provides a microlithography projection objective which includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes a last optical element and a penultimate optical element. A distance between the last optical element and the penultimate optical element is variable. The disclosure also provides a microlithography projection exposure machine including such a projection objective, and a method of making semiconductor components using such a projection exposure machine.

Abstract: An anamorphic objective is provided for imaging an object onto an image acquisition unit. The anamorphic objective has at least one first plane of symmetry and at least one second plane of symmetry. The first plane of symmetry and the second plane of symmetry are oriented perpendicular to one another. The first plane of symmetry and the second plane of symmetry intersect and have a straight line of intersection (intersection line). A first objective section followed by a second objective section are arranged. A diaphragm is arranged between the first objective section and the second objective section. A first anamorphic optical element is arranged in the first objective section. A second anamorphic optical element is arranged in the second objective section. The anamorphic objective fulfills specified conditions and is suitable for generating a stigmatic imaging of the object on the image acquisition unit.

Abstract: The present invention relates to a lens or objective for a camera, more particularly for a digital camera, comprising a housing, an actuating element arranged on the housing, and a lens element system that can be set into a plurality of settings, wherein the lens element system is embodied in such a way that in at least one setting an f-number is F?3. The lens element system is furthermore embodied in such a way that an actuation of the actuating element brings about a movement of two optical elements relative to one another, such that an intersection length difference of the lens element system can be set.

Abstract: An anamorphic objective is provided for imaging an object onto an image acquisition unit. The anamorphic objective has at least one first plane of symmetry and at least one second plane of symmetry. The first plane of symmetry and the second plane of symmetry are oriented perpendicular to one another. The first plane of symmetry and the second plane of symmetry intersect and have a straight line of intersection (intersection line). A first objective section followed by a second objective section are arranged. A diaphragm is arranged between the first objective section and the second objective section. A first anamorphic optical element is arranged in the first objective section. A second anamorphic optical element is arranged in the second objective section. The anamorphic objective fulfills specified conditions and is suitable for generating a stigmatic imaging of the object on the image acquisition unit.

Abstract: The present invention relates to a lens or objective for a camera, more particularly for a digital camera, comprising a housing, an actuating element arranged on the housing, and a lens element system that can be set into a plurality of settings, wherein the lens element system is embodied in such a way that in at least one setting an f-number is F?3. The lens element system is furthermore embodied in such a way that an actuation of the actuating element brings about a movement of two optical elements relative to one another, such that an intersection length difference of the lens element system can be set.

Abstract: A microlithographic projection exposure apparatus includes an illumination system and a projection objective. During use of the microlithographic projection exposure apparatus, the illumination system illuminates an object plane of the projection objective. The illumination system is configured so that light components in point-symmetrical relationship with each other, which are produced during use of the illumination system and which are only superposed in the object plane, have mutually orthogonal polarization states.

Abstract: The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.

Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis.