Abstract: A device for scanning Frequency-Modulated Continuous Wave LiDAR range measurement comprises a light source that produces light having a varying frequency, a splitter that splits the light into reference light and output light, and a distribution matrix (36) that distributes the output light among a plurality of free space couplers that outcouple the output light into free space. A plurality of optical waveguides guide input light that was reflected at an object. A detector detects a superposition of the input light with the reference light, and a calculation unit determines the range to the object from the superposition detected by the detector. The device further comprises a common optical waveguide that is optically connected to the plurality of optical waveguides and the detector so that input light that is guided in any of the optical waveguides propagates through the common optical waveguide towards the detector without passing the distribution matrix.

Abstract: A device for scanning frequency-modulated continuous wave (FMCW) LiDAR range measurement has a light source producing light having a varying frequency, a splitter splitting the light into reference light and output light, and an optical system having an optical axis. A plurality of free space couplers are arranged along a line such that the distance between adjacent free space couplers increases with increasing distance from the optical axis. Each free space coupler outcouples the output light into the free space and receives input light that was reflected at an object. A detector detects a superposition of the input light with the reference light, and a calculation unit determines the range to the object from the superposition detected by the detector.

Abstract: A device for scanning range measurement to an object has a light source that generates an optical output signal having a varying frequency. A plurality of optical processing units are connected optically in parallel to the light source. Each processing unit has an optical distribution matrix with a plurality of optical switches that distribute the optical output signals from the light source selectively to different optical waveguides. A plurality of free space couplers outcouple the optical output signals into the free space, and couple optical output signals, which were reflected on the object, into the associated optical waveguides as optical measurement signals. A polarization sensitive light splitter directs the optical measurement signals detectors that detect a superposition of the optical measurement signals with the optical output signals supplied via a local oscillator light path.

Abstract: A light source for a frequency-modulated continuous-wave (FMCW) LiDAR device is formed by a photonic integrated circuit and comprises a substrate and a multilayer structure. Formed in the multilayer structure is a semiconductor laser that is received in a recess etched into the multilayer structure. An optical path between the semiconductor laser and a reflector forms an external cavity for the semiconductor laser. The external cavity includes a variable attenuator causing an attenuation of light guided in the cavity optical waveguide. The external cavity may also or alternatively include an optical phase modulator.

Abstract: A device for scanning measurement of a distance to an object has a light source, which generates an optical output signal having a time-varying frequency. The device includes multiple optical processing units, which are connected optically in parallel to the light source. Each processing unit has an optical distribution matrix including multiple optical switches that distribute optical output signals selectively onto different optical waveguides. Optical output signals are outcoupled into the free space via free space couplers and optical output signals reflected on the object are coupled as optical measurement signals into the waveguides. A detector detects a superposition of the optical measurement signal and the optical output signal generated by the light source. A circulator directs optical output signals supplied by the light source to the distribution matrix and optical measurement signals coming from the distribution matrix to the detector.

Abstract: A device for scanning measurement of a distance to an object has a light source, which generates an optical output signal having a time-varying frequency. The device includes multiple optical processing units, which are connected optically in parallel to the light source. Each processing unit has an optical distribution matrix including multiple optical switches that distribute optical output signals selectively onto different optical waveguides. Optical output signals are outcoupled into the free space via free space couplers and optical output signals reflected on the object are coupled as optical measurement signals into the waveguides. A detector detects a superposition of the optical measurement signal and the optical output signal generated by the light source. A circulator directs optical output signals supplied by the light source to the distribution matrix and optical measurement signals coming from the distribution matrix to the detector.

Abstract: A device for scanning measurement of the distance to an object comprises a light source that produces optical signals each having a varying frequency. An optical distribution matrix comprising optical switches and/or optical splitters distributes the optical signals simultaneously or successively onto optical output waveguides. A deflection optical unit deflects the optical signals when exiting from the optical output waveguides so that they are emitted in different directions from the device. A plurality of detectors detect a superposition of one of the optical signals produced by the light source with an optical signal which was reflected from the object. Input waveguides, which are independent of the output waveguides, guide the optical signals reflected from the object to the detectors while bypassing the optical distribution matrix. An evaluation unit determines a distance to the object from the superposition detected by the detectors.

Abstract: An apparatus and method for scanning ascertainment of a distance to an object are disclosed. Lasers of a light source emit a plurality of optical signals each having a time-varying frequency. At a given time, the frequencies of the optical signals are different. An evaluation device ascertains the distance to the object on the basis of measurement optical signals that were emitted by the light source and reflected or scattered at the object, and of reference optical signals that were emitted by the light source and were not reflected or scattered at the object. A dispersive scanning device simultaneously deflects the optical signals in different frequency-dependent directions.

Abstract: A device for scanning measurement of a distance to an object has a light source, which generates an optical output signal having a time-varying frequency. The device includes multiple optical processing units, which are connected optically in parallel to the light source. Each processing unit has an optical distribution matrix including multiple optical switches that distribute optical output signals selectively onto different optical waveguides. Optical output signals are outcoupled into the free space via free space couplers and optical output signals reflected on the object are coupled as optical measurement signals into the waveguides. A detector detects a superposition of the optical measurement signal and the optical output signal generated by the light source. A circulator directs optical output signals supplied by the light source to the distribution matrix and optical measurement signals coming from the distribution matrix to the detector.

Abstract: An apparatus for ascertaining a distance to an object has a light source that emits an optical signal having a time-varying frequency. An evaluation device ascertains a distance to the object based on a measurement signal that originated from the optical signal and was reflected at the object and, and on a reference signal that was not reflected at the object. A dispersive element produces a frequency-selective angle distribution of the measurement signal that has a plurality of partial signals which are steered to the object at mutually different angles.

Abstract: An apparatus for ascertaining a distance to an object has a light source that emits an optical signal having a time-varying frequency. An evaluation device ascertains a distance to the object based on a measurement signal that originated from the optical signal and was reflected at the object and, and on a reference signal that was not reflected at the object. A deflection device changes an angle, at which the measurement signal is steered to the object, during a period of the optical signal in which the frequency of the optical signal has a monotonic time dependence.

Abstract: The disclosure provides an illumination system of a microlithographic projection device having an image plane, in which a mask can be arranged, and a first object plane, which is optically conjugate to the image plane. A first illumination optical unit illuminates the first object plane with first projection light so that the first projection light has a first illumination angle distribution in the image plane. A second illumination optical unit illuminates a second object plane, which is optically conjugate to the image plane, with second projection light so that the second projection light has a second illumination angle distribution differing from the first illumination angle distribution in the image plane. An optical integrator is arranged exclusively in the light path of the first projection light.

Abstract: A microlithography illumination system includes a first light source configured to generate pulses of light, a second light source configured to generate further pulses of light offset temporally relative to the pulses of light generated by the first light source, an array of optical elements digitally switchable between first and second switching positions, and a control device to drive the optical elements so that during use the switching position of the optical elements is unchanged while any of the first and second light sources generates a light pulse. In the first switching position of the optical elements, the array couples light pulses generated by the first light source into a common beam path of the illumination system. In the second switching position of the optical elements, the array couples light pulses generated by the second light source into a common beam path of the illumination system.

Abstract: The disclosure provides an illumination system of a microlithographic projection device having an image plane, in which a mask can be arranged, and a first object plane, which is optically conjugate to the image plane. A first illumination optical unit illuminates the first object plane with first projection light so that the first projection light has a first illumination angle distribution in the image plane. A second illumination optical unit illuminates a second object plane, which is optically conjugate to the image plane, with second projection light so that the second projection light has a second illumination angle distribution differing from the first illumination angle distribution in the image plane. An optical integrator is arranged exclusively in the light path of the first projection light.

Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed manner and a DMD (digital mirror device) or another array of optical elements, which are digitally switchable between two switching positions.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed fashion and an array of optical elements which are digitally switchable between two switching positions. The array may be produced using MEMS technology.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed fashion and an array of optical elements which are digitally switchable between two switching positions. The array may be produced using MEMS technology.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a pupil forming unit directing light on a spatial light modulator that transmits or reflects impinging light in a spatially resolved manner. An objective images a light exit surface of the spatial light modulator on light entrance facets of an optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. The pupil forming unit and the spatial light modulator are controlled so that the object area is completely illuminated by the pupil forming unit and projection light associated with a point in the object area is at least partially and variably prevented from impinging on the one of the light entrance facets.

Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.