Abstract: This invention relates to a plasma reactor apparatus having improved etch uniformity and throughput. Higher etch uniformity is achieved through the use of a new gas delivery mechanism and a thermally insulated wafer chuck. The vacuum insulated chuck also results in lower energy consumption and higher throughput.

Abstract: This invention relates to a plasma reactor apparatus having improved etch uniformity and throughput. Higher etch uniformity is achieved through the use of a new gas delivery mechanism and a thermally insulated wafer chuck. The vacuum insulated chuck also results in lower energy consumption and higher throughput.

Abstract: This invention relates to a plasma reactor apparatus having improved etch uniformity and throughput. Higher etch uniformity is achieved through the use of a new gas delivery mechanism and a thermally insulated wafer chuck. The vacuum insulated chuck also results in lower energy consumption and higher throughput.

Abstract: The positioning system, particularly useful for moving a stage mounting a semiconductor wafer for the manufacture of semiconductor devices, provides a lead screw and zero backlash nut for coarse motion of the stage. A thrust member fixedly mounts the nut and the member is flexurally mounted to a housing supporting the stage acting through a piezoelectric motor connection. This action brings the stage in a coarse adjustment mode into the capture range of the piezoelectric motor for fine adjustment by in and out movement of a pusher rod extending from the motor. Flexures allow motion of the thrust member parallel to the lead screw and protects the piezoelectric motor from undesirable side loads. A separate duplicate mechanism is used for each of x-axis and y-axis movements of the housing and stage to bring the stage to a precise position by the respective coarse and fine translationary movements of the lead screw, thrust members and piezoelectric motors.

Abstract: A double-ended, drum seaming machine--which includes spaced, bed-supported columns carrying drum-engaging rotary chucks and drum seaming units--embodying a structural arrangement, in association with included stripper rods, which provides for pre-adjustment of the relative positions of the columns on the bed (according to drum length), and for predetermination of the limited-travel, working stroke of the individual columns between a retracted clearance position and an advanced position with the corresponding rotary chuck in drum head engagement.