Abstract: A method of preparing transparent artworks by forming a predetermined topological relief pattern by way of local layer-by-layer removal of the material on the side of the masking layer which is translucent to actinic radiation, with concurrent measurement of the optical phase difference between actinic light rays passing through the masking layer and a substrate transparent to actinic light, until the geometrical relief of the pattern becomes deep enough to ensure the required optical phase difference which is a multiple of 2.pi..

Abstract: The method of making coloured photomasks used in manufacture of printed-circuit boards and microcircuits, consisting in doping the surface of a glass substrate with a staining metal by virtue of a repeated electrodiffusion of the ions of the staining metal occurring from diverse melts, followed by reduction of the staining metal. Further on, a protective layer is applied to the glass substrate stained layer, corresponding to a predetermined pattern, the unprotected portions of the stained layer are removed and the protective layer is eliminated.