Patents by Inventor Vladimir J. Dmitriev

Vladimir J. Dmitriev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for DUV transmission mapping
    Patent number: 8592770
    Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: November 26, 2013
    Assignee: Carl Zeiss SMS Ltd.
    Inventors: Guy Ben-Zvi, Eitan Zait, Vladimir J. Dmitriev, Steven M. Labovitz, Erez Graitzer, Ofir Sharoni
  • METHOD AND APPARATUS FOR DUV TRANSMISSION MAPPING
    Publication number: 20110101226
    Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.
    Type: Application
    Filed: July 10, 2008
    Publication date: May 5, 2011
    Inventors: Guy Ben-Zvi, Eitan Zait, Vladimir J. Dmitriev, Steven M. Labovitz, Erez Graitzer, Ofir Sharoni
  • Method and system for repairing defected photomasks
    Patent number: 7459242
    Abstract: A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: December 2, 2008
    Assignee: Pixer Technology Ltd.
    Inventors: Eitan Zait, Vladimir J. Dmitriev, Sergey V Oshemkov, Nikolay N. Guletskiy, Guy Ben-Zvi