Abstract: The invention provides a method of forming copper arsenate. Copper and arsenic are leached into a treatment solution maintained at a pH level of about 2 to 5 in the presence of at least one impurity. An oxidant is added to the treatment solution to oxidize the copper and arsenic. A copper arsenate compound is precipitated from the solution as copper arsenate. Preferably, the copper arsenate is then releached in a purification solution. The molar ratio of copper to arsenic is adjusted to a level of at least 2. The pH of the purification solution is then increased to precipitate copper arsenate having a decreased concentration of said at least one impurity. Impure copper arsenate may be suspended and reacted in a recrystallization solution preferably having cupric ion. The pH of recrystallization solution is adjusted to a valve between about 1 and 4.5.