Patents by Inventor Vladimir Kampel

Vladimir Kampel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8298750
    Abstract: Positive-working imageable elements having improved sensitivity, high resolution, and solvent resistance are prepared using a water-insoluble polymeric binder comprising vinyl acetal recurring units that have pendant hydroxyaryl groups, and recurring units comprising carboxylic acid aryl ester groups that are substituted with a cyclic imide group. These imageable elements can be imaged and developed to provide various types of elements including lithographic printing plates.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: October 30, 2012
    Assignee: Eastman Kodak Company
    Inventors: Moshe Levanon, Georgy Bylina, Vladimir Kampel, Marina Rubin, Larisa Postel, Tanya Kurtser, Moshe Nakash
  • Patent number: 8048609
    Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic acid ester groups, some of which can be substituted with cyclic imide moieties.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: November 1, 2011
    Assignee: Eastman Kodak Company
    Inventors: Moshe Levanon, Georgy Bylina, Vladimir Kampel, Larisa Postel, Marina Rubin, Tanya Kurtser
  • Patent number: 7955779
    Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
    Type: Grant
    Filed: August 21, 2009
    Date of Patent: June 7, 2011
    Assignee: Eastman Kodak Company
    Inventors: Moshe Levanon, Emmanuel Lurie, Vladimir Kampel
  • Publication number: 20110059399
    Abstract: Positive-working imageable elements having improved sensitivity, high resolution, and solvent resistance are prepared using a water-insoluble polymeric binder comprising vinyl acetal recurring units that have pendant hydroxyaryl groups, and recurring units comprising carboxylic acid aryl ester groups that are substituted with a cyclic imide group. These imageable elements can be imaged and developed to provide various types of elements including lithographic printing plates.
    Type: Application
    Filed: September 8, 2009
    Publication date: March 10, 2011
    Inventors: Moshe Levanon, Georgy Bylina, Vladimir Kampel, Marina Rubin, Larisa Postel, Tanya Kurtser, Moshe Nakash
  • Publication number: 20100159390
    Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic acid ester groups, some of which can be substituted with cyclic imide moieties.
    Type: Application
    Filed: December 19, 2008
    Publication date: June 24, 2010
    Inventors: Moshe Levanon, Georgy Bylina, Vladimir Kampel, Larisa Postel, Marina Rubin, Tanya Kurtser
  • Patent number: 7723012
    Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: May 25, 2010
    Assignee: Eastman Kodak Company
    Inventors: Moshe Levanon, Emmanuel Lurie, Vladimir Kampel
  • Publication number: 20090311626
    Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
    Type: Application
    Filed: August 21, 2009
    Publication date: December 17, 2009
    Inventors: Moshe Levanon, Emmanuel Lurie, Vladimir Kampel
  • Publication number: 20090004599
    Abstract: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.
    Type: Application
    Filed: June 28, 2007
    Publication date: January 1, 2009
    Inventors: Moshe Levanon, Emmanuel Lurie, Vladimir Kampel