Patents by Inventor Vladimir Mikhailovich KRIVTSUN

Vladimir Mikhailovich KRIVTSUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10770282
    Abstract: The light source contains a gas filled chamber with a region of radiating plasma sustained by a focused beam of a CW laser. The means for plasma ignition is a pulsed laser system generating a first and a second laser beams focused in the chamber. The first laser beam provides the optical breakdown, after which the second laser beam ignites the plasma, whose volume and density are sufficient for stationary plasma sustenance by CW laser after finishing the second laser pulse. Preferably, the first laser beam is generated in Q-switching mode and the second laser beam is generated in free-running mode. The technical result consists in ensuring high reliability of igniting the plasma, in creating in this basis electrodeless high-brightness broadband light sources with the high spatial and power stability, and in providing an ability to collect broadband plasma radiation in a spatial angle of more than 9 sr.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: September 8, 2020
    Assignee: RnD-ISAN, Ltd
    Inventors: Dmitry Borisovich Abramenko, Robert Rafilevich Gayasov, Yurii Borisovich Kiryukhin, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Patent number: 10753798
    Abstract: The invention relates to a compact wideband vacuum ultraviolet (VUV) and soft X-ray grazing incidence spectrometer based on a plane amplitude diffraction grating. The spectrometer enables simultaneous detection of a VUV spectrum in a positive first order of diffraction and a negative first order of diffraction. The technical result of the invention is that of recording a spectrum in a wide spectral range (3-200 nm) with a moderate spectral resolution (?/??˜15-30) and with a significantly higher spectral resolution (?/??˜100-200) in a narrow soft X-ray or extreme ultraviolet range with the possibility of measuring the absolute radiation output in these regions of the spectrum.
    Type: Grant
    Filed: July 10, 2018
    Date of Patent: August 25, 2020
    Assignee: RnD-ISAN, Ltd
    Inventors: Dmitriy Borisovich Abramenko, Vladimir Mikhailovich Krivtsun, Aleksander Petrovich Shevelko, Oleg Feliksovich Yakushev
  • Publication number: 20200173853
    Abstract: The invention relates to a compact wideband vacuum ultraviolet (VUV) and soft X-ray grazing incidence spectrometer based on a plane amplitude diffraction grating. The spectrometer enables simultaneous detection of a VUV spectrum in a positive first order of diffraction and a negative first order of diffraction. The technical result of the invention is that of recording a spectrum in a wide spectral range (3-200 nm) with a moderate spectral resolution (?/??˜15-30) and with a significantly higher spectral resolution (?/??˜100-200) in a narrow soft X-ray or extreme ultraviolet range with the possibility of measuring the absolute radiation output in these regions of the spectrum.
    Type: Application
    Filed: October 7, 2018
    Publication date: June 4, 2020
    Inventors: Dmitriy Borisovich ABRAMENKO, Vladimir Mikhailovich KRIVTSUN, Aleksander Petrovich SHEVELKO, Oleg Feliksovich YAKUSHEV
  • Publication number: 20200163197
    Abstract: Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.
    Type: Application
    Filed: January 27, 2020
    Publication date: May 21, 2020
    Inventors: Vladimir Vitalievich IVANOV, Aleksandr Yurievich VINOKHODOV, Konstantin Nikolaevich KOSHELEV, Mikhail Sergeyevich KRIVOKORYTOV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH, Vyacheslav Valerievich MEDVEDEV, Yury Viktorovich SIDELNIKOV, Oleg Feliksovich YAKUSHEV, Oleg Borisovich KHRISTOFOROV, Denis Aleksandrovich GLUSHKOV, Samir ELLWI
  • Patent number: 10638588
    Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: April 28, 2020
    Assignees: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev
  • Patent number: 10588210
    Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: March 10, 2020
    Assignees: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Oleg Borisovich Khristoforov, Denis Aleksandrovich Glushkov, Samir Ellwi
  • Publication number: 20200060014
    Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.
    Type: Application
    Filed: August 8, 2019
    Publication date: February 20, 2020
    Inventors: Aleksandr Yurievich VINOKHODOV, Vladimir Vitalievich IVANOV, Konstantin Nikolaevich KOSHELEV, Mikhail Sergeyevich KRYVOKORYTOV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH, Vyacheslav Valerievich MEDVEDEV, Yury Viktorovich SIDELNIKOV, Oleg Feliksovich YAKUSHEV, Oleg Borisovich KHRISTOFOROV, Denis Aleksandrovich GLUSHKOV, Samir ELLWI
  • Publication number: 20190166679
    Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.
    Type: Application
    Filed: August 14, 2018
    Publication date: May 30, 2019
    Applicants: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich VINOKHODOV, Vladimir Vitalievich IVANOV, Konstantin Nikolaevich KOSHELEV, Mikhail Sergeyevich KRYVOKORYTOV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH, Vyacheslav Valerievich MEDVEDEV, Yury Viktorovich SIDELNIKOV, Oleg Feliksovich YAKUSHEV
  • Patent number: 9476841
    Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: October 25, 2016
    Assignee: OOO “Isteq B.V.”
    Inventors: Pavel Stanislavovich Antsiferov, Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Kryvokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Denis Alexandrovich Glushkov, Samir Ellwi, Pavel Viktorovich Seroglazov
  • Patent number: 9368337
    Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: June 14, 2016
    Assignee: OOO “RnD-ISAN”
    Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Patent number: 9357627
    Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: May 31, 2016
    Assignee: OOO “RnD-ISAN”
    Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Publication number: 20160044774
    Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability, brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and predetermined radiation power is maintained via an automated control system.
    Type: Application
    Filed: April 8, 2014
    Publication date: February 11, 2016
    Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
  • Publication number: 20150311058
    Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation.
    Type: Application
    Filed: August 23, 2013
    Publication date: October 29, 2015
    Applicant: RND-ISAN, LTD
    Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH