Patents by Inventor Vladimir Petrovich Ovsyannikov

Vladimir Petrovich Ovsyannikov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10297413
    Abstract: The invention relates to a novel ion source, which uses method for the production of highly charged ions in the local ion traps created by an axially symmetric electron beam in the thick magnetic lens. The highly charged ions are produced in the separate local ion traps, which are created as a sequence of the focuses (F1, F2, and F3) of the electron beam (EB) rippled in the magnetic field (B(z)). Since the most acute focus is called the main one, the ion source is classified as main magnetic focus ion source (MaMFIS/T), which can also operate in the trapping regime. The electron current density in the local ion traps can be much greater than that in the case of Brillouin flow. For the ion trap with length of about 1 mm, the average electron current density of up to the order of 100 kA/cm2 can be achieved. Thus it allows one to produce ions in any charge state for all elements of the Periodic Table.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: May 21, 2019
    Assignee: North-Western International Cleaner Production Centre
    Inventors: Vladimir Petrovich Ovsyannikov, Andrei Vladimirovich Nefiodov, Oleg Kostantinovich Kultashev
  • Publication number: 20180040450
    Abstract: The invention relates to a novel ion source, which uses method for the production of highly charged ions in the local ion traps created by an axially symmetric electron beam in the thick magnetic lens. The highly charged ions are produced in the separate local ion traps, which are created as a sequence of the focuses (F1, F2, and F3) of the electron beam (EB) rippled in the magnetic field (B(z)). Since the most acute focus is called the main one, the ion source is classified as main magnetic focus ion source (MaMFIS/T), which can also operate in the trapping regime. The electron current density in the local ion traps can be much greater than that in the case of Brillouin flow. For the ion trap with length of about 1 mm, the average electron current density of up to the order of 100 kA/cm2 can be achieved. Thus it allows one to produce ions in any charge state for all elements of the Periodic Table.
    Type: Application
    Filed: March 10, 2016
    Publication date: February 8, 2018
    Inventors: Vladimir Petrovich Ovsyannikov, Andrei Vladimirovich Nefiodov, Oleg Kostantinovich Kultashev
  • Patent number: 6717155
    Abstract: The invention provides an electron impact ion source for the generation of multiply- or super-highly-chared ions including an electron gun with cathode and anode for the creation and acceleration of electrons, a device for the axial-symmetric focussing of the electron beam, a device for introducing ionisable substances into an ion trap, which may be opened and closed, in the region of the axial-symmetric focussed electron beam, a device for destroying the electrons after they have passed the ion trap, and a device for creating a vacuum around the axial-symmetrically focussed electron beam and the ion trap within said beam. The device for the axial-symmetric focussing of the electron beam comprises at least two ring structures radially magnetized in opposing directions and each of these ring structures enclosed the electron beam.
    Type: Grant
    Filed: June 5, 2002
    Date of Patent: April 6, 2004
    Assignee: Technische Universitaet Dresden
    Inventors: Guenter Zschornack, Vladimir Petrovich Ovsyannikov, Frank Grossmann, Oleg Konstantinovich Koulthachev