Patents by Inventor Vladimir Vital?evitch Ivanov

Vladimir Vital?evitch Ivanov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation source, lithographic apparatus and device manufacturing method
    Patent number: 7528395
    Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: May 5, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital'Evitch Ivanov, Erik René Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns
  • Radiation source, lithographic apparatus, and device manufacturing method
    Patent number: 6933510
    Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: August 23, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Givi Georgievitch Zukavishvili, Vladimir Vital'Evitch Ivanov, Konstantin Nikolaevitch Koshelev, Evgenil Dmitreevitch Korob, Vadim Yevgenyevich Banine, Pavel Stanislavovich Antsiferov
  • Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby
    Patent number: 6862075
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: March 1, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital′evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine
  • Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6818912
    Abstract: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
    Type: Grant
    Filed: November 5, 2003
    Date of Patent: November 16, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital'evitch Ivanov
  • Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6667484
    Abstract: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
    Type: Grant
    Filed: June 28, 2001
    Date of Patent: December 23, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital'evitch Ivanov
  • Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6614505
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Grant
    Filed: January 7, 2002
    Date of Patent: September 2, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital'evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine
  • Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: RE41362
    Abstract: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: June 1, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital'evitch Ivanov