Patents by Inventor Vladimir Vitalevitsch Ivanov

Vladimir Vitalevitsch Ivanov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8279397
    Abstract: A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: October 2, 2012
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Vadim Banine, Vladimir Vitalevitsch Ivanov