Abstract: An apparatus for deposition of coatings upon substrates generates a non-local thermal equilibrium arc plasma at the relatively high pressure of at least approximately 1 atmosphere. A closed chamber (25) is defined by a cylindrical anode (11) and annular housings (21, 22) carrying transparent end plates (23, 24). A pencil-shaped cathode (12) is passed through one end plate (23 or 24) coaxially into chamber (25) so that its tapered end (20) is spatially proximate to an exit orifice (44) centrally located in anode (11). Gas ports (30, 31) permit the introduction of a preselected gaseous environment at the desired pressure into chamber (25). A low-current arc is struck between anode (11) and cathode (12) establishing the desired plasma. Two coils (33, 34) are coaxially placed radially outward of both ends of the chamber in a Helmholtz coil configuration to generate a uniform magnetic field in chamber (25) and induce rotation of the arc plasma.

Abstract: A method is provided for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma including the steps of generating a non-LTE arc plasma at a pressure greater than about 0.1 atmospheres, introducing a coating material into the arc plasma, positioning a substrate material proximate to the arc plasma whereby activated species of said coating material formed by the arc plasma contact the substrate to form a coating.