Patents by Inventor Vladimir Zhitnikov

Vladimir Zhitnikov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrochemical machining method with optimal machining pulse duration
    Patent number: 6723223
    Abstract: For an electromechanical machining of a work piece there is an optimal pulse duration for the machining pulses corresponding to the maximum copying accuracy. Such an optimal pulse duration corresponds to a certain value of the gap. By alternating the machining pulses with measurement pulses it is possible to obtain an accurate information about the gap dimensions on-line during the electrochemical machining process. The process control means (20) are used to automate the electromechanical machining, while keeping it in the optimal mode. For this purpose the process control means (20) comprise the pulse control unit (26) to establish the pulse duration of the voltage pulses to be applied across the gap (4).
    Type: Grant
    Filed: May 7, 2002
    Date of Patent: April 20, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Alexandr Zaitsev, Sergey Bezroukov, Igor Leonidovich Agafonov, Aleksandr Leonidovich Belogorsky, Maxim Smirnov, Vladimir Zhitnikov
  • Electrochemical machining method with optimal machining pulse duration
    Publication number: 20030010651
    Abstract: For an electromechanical machining of a work piece there is an optimal pulse duration for the machining pulses corresponding to the maximum copying accuracy. Such an optimal pulse duration corresponds to a certain value of the gap. By alternating the machining pulses with measurement pulses it is possible to obtain an accurate information about the gap dimensions on-line during the electrochemical machining process. The process control means (20) are used to automate the electromechanical machining, while keeping it in the optimal mode. For this purpose the process control means (20) comprise the pulse control unit (26) to establish the pulse duration of the voltage pulses to be applied across the gap (4).
    Type: Application
    Filed: May 7, 2002
    Publication date: January 16, 2003
    Inventors: Alexandr Zaitsev, Sergey Bezroukov, Igor Leonidovich Agafonov, Aleksandr Leonidovich Belogorsky, Maxim Smirnov, Vladimir Zhitnikov