Patents by Inventor Vladislav Sklyarevich

Vladislav Sklyarevich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060113025
    Abstract: A method for laminating glass sheets wherein laminating film (1) is placed over one surface of a first glass sheet (2) and the film (1) is heated with short wave radiation (4) to a bonding temperature. Heated areas (8) of the film (1) are successively pressed to the glass sheet (2) in a continuous manner for purging air from between the film (1) and the first glass sheet (2) and for applying bonding pressure. The pressed film areas (8) are then cooled whereby an appropriate bond is attained between the film (1) and the first glass sheet (2). Thereafter the first glass sheet (2) with its bonded film is subjected to a partial vacuum and a second glass sheet (10) is positioned on the film (1) and the second glass sheet (10) is pressed (11) to the film (1).
    Type: Application
    Filed: January 9, 2006
    Publication date: June 1, 2006
    Inventors: Vladislav Sklyarevich, Mylehaylo Shevelev
  • Publication number: 20050221017
    Abstract: A method for heat treatment of coatings for application to metal surfaces wherein a ceramic is positioned adjacent to the coating to be treated and the ceramic is exposed to a microwave beam having a predetermined frequency and power density which are sufficient to heat the ceramic to a desired temperature whereby the coating is adhered to an applied metal surface without temperature degradation of the metal.
    Type: Application
    Filed: March 30, 2004
    Publication date: October 6, 2005
    Inventors: Vladislav Sklyarevich, Mykhaylo Shevelev
  • Publication number: 20050150586
    Abstract: A method for laminating glass sheets wherein laminating film is placed over one surface of a first glass sheet and the film is heated with microwave radiation to a bonding temperature. Heated areas of the film are successively pressed to the glass sheet in a continuous manner for purging air from between the film and the first glass sheet and for applying bonding pressure. The pressed film areas are then cooled whereby an appropriate bond is attained between the film and the first glass sheet. Thereafter the first glass sheet with its bonded film is subjected to a partial vacuum and a second glass sheet is positioned on the film and the second glass sheet is pressed to the film. The film is then reheated with microwave radiation to a bonding temperature and thereafter cooled whereby an appropriate bond is obtained between the film and the second glass sheet to provide a glass lamination.
    Type: Application
    Filed: March 17, 2004
    Publication date: July 14, 2005
    Inventors: Vladislav Sklyarevich, Mykhaylo Shevelev
  • Patent number: 6424090
    Abstract: A system and method for increasing the power density distribution uniformity of a gyrotron radiation beam provides a mirror for reflecting the gyrotron beam onto an object to be irradiated, where the shape of the mirror surface is changed by a plurality of controllable and movable mirror support members in a chaotic or random manner during generation of the gyrotron beam on the mirror surface, and the shape of the mirror surface is changed at a predetermined frequency F according to a predefined algorithm.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: July 23, 2002
    Assignee: GTI
    Inventor: Vladislav Sklyarevich
  • Patent number: 6423605
    Abstract: A practical, low-cost method for forming an ultra-shallow junction in a semiconductor material is provided. The method is directed to an initial RTA process using a heat source at a selected temperature and time sufficient to eliminate lattice defects without significant diffusion of the dopants, along with subsequent exposure to electromagnetic radiation having a frequency in the range of the resonance frequency of interstitial impurity ions. The intensity of the electric field is selected to be proportional to the value of the activation barrier potential of the impurity ions. The method may be used for any dopant material.
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: July 23, 2002
    Assignee: Gyrotron Technology, Inc.
    Inventors: Vladislav Sklyarevich, Michael Shevelev