Patents by Inventor Vladmir PROTOPOPOV

Vladmir PROTOPOPOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor substrate measuring apparatus, semiconductor substrate processing apparatus and semiconductor device manufacturing method using the same
    Patent number: 11287323
    Abstract: A semiconductor substrate processing apparatus includes a transfer chamber disposed between process chambers performing processing of a semiconductor substrate, a transfer robot disposed inside the transfer chamber to load the semiconductor substrate into the process chamber and unload the semiconductor substrate whose processing has been performed in the process chamber, an optical assembly irradiates irradiation light having multiple wavelengths onto the semiconductor substrate, the optical assembly splitting measurement light reflected from a surface of the semiconductor substrate into first and second measurement light and collecting interference light caused by first reflected light and second reflected light, a light detector detecting the interference light and converting the interference light into an electric signal to produce an interference signal, and a controller extracting spectrum information for each wavelength of the measurement light from the interference signal and calculating distribution
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: March 29, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hoonseop Kim, Vladmir Protopopov, Minju Kim
  • SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS, SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
    Publication number: 20210102841
    Abstract: A semiconductor substrate processing apparatus includes a transfer chamber disposed between process chambers performing processing of a semiconductor substrate, a transfer robot disposed inside the transfer chamber to load the semiconductor substrate into the process chamber and unload the semiconductor substrate whose processing has been performed in the process chamber, an optical assembly irradiates irradiation light having multiple wavelengths onto the semiconductor substrate, the optical assembly splitting measurement light reflected from a surface of the semiconductor substrate into first and second measurement light and collecting interference light caused by first reflected light and second reflected light, a light detector detecting the interference light and converting the interference light into an electric signal to produce an interference signal, and a controller extracting spectrum information for each wavelength of the measurement light from the interference signal and calculating distribution
    Type: Application
    Filed: August 26, 2020
    Publication date: April 8, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Hoonseop KIM, Vladmir PROTOPOPOV, Minju KIM