Abstract: A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

Abstract: A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract: An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.

Abstract: An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

Abstract: An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter Da which is larger than a diameter Di of the bore of the inner pole piece of the magnetic lens. The following relationship is satisfied: 1.5·Di?Da?3·Di. The lower end of the inner pole piece is disposed in a distance of at least 2 mm offset from the inner end of the outer pole piece in a direction of the optical axis.

Abstract: An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.

Abstract: An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter Da which is larger than a diameter Di of the bore of the inner pole piece of the magnetic lens. The following relationship is satisfied: 1.5·Di?Da?3·Di. The lower end of the inner pole piece is disposed in a distance of at least 2 mm offset from the inner end of the outer pole piece in a direction of the optical axis.

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract: An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter Da which is larger than a diameter Di of the bore of the inner pole piece of the magnetic lens. The following relationship is satisfied: 1.5·Di?Da?3·Di. The lower end of the inner pole piece is disposed in a distance of at least 2 mm offset from the inner end of the outer pole piece in a direction of the optical axis.

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

Abstract: A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.

Abstract: An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter Da which is larger than a diameter Di of the bore of the inner pole piece of the magnetic lens. The following relationship is satisfied: 1.5·Di?Da?3·Di. The lower end of the inner pole piece is disposed in a distance of at least 2 mm offset from the inner end of the outer pole piece in a direction of the optical axis.

Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

Abstract: An electron beam device has an electron gun for generating an electron beam, an objective lens for focusing the electron beam on an object and at least one detector for detecting electrons emitted by the object or electrons backscattered by the object. Detection of electrons emitted by or backscattered by an object may be simplified and improved using quadrupole devices and certain configurations of these devices provided in the electron beam device.

Abstract: A detector for scanning electron microscopes, which can be used under different pressure conditions in the specimen chamber of the electron microscope, designed for the detection of both electrons and light. For this purpose, the detector has a photodetector and a scintillator of a material transmissive for visible light connected before the photodetector. The scintillator can be provided with a coating transparent to visible light. By the application of different potentials, the detector is suitable for the detection of electrons in high vacuum and for the detection of light with high pressures in the specimen chamber.

Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.

Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.