Abstract: An x-ray fluorescence analysis device, including an x-ray source for irradiating a sample with x-ray radiation, an x-ray detector for measuring x-ray fluorescence radiation emitted by the sample, and a camera for producing an optical control image of the irradiated measurement point of a sample by means of an optical mirror arranged at an angle in the beam path of the x-ray source, which optical mirror includes a carrier having a mirror layer provided on the carrier. In order to create an x-ray florescence device by means of which realistic control recordings of the sample to be analyzed, in particular of the sampled surface point, the optical mirror has a passage window for the x-ray radiation, which is formed by an opening in the carrier and a foil forming the mirror layer and covering the opening on an outer surface of the carrier.

Abstract: The invention relates to an x-ray fluorescence analysis device, comprising an x-ray source (10) for irradiating a sample (15) with x-radiation (19), an x-ray detector (17) for measuring x-ray fluorescence radiation (16) emitted by the sample (15), and a camera (25) for producing an optical control image (26) of the irradiated measurement point (29) of a sample (15) by means of the optical mirror (20) arranged at an angle in the beam path of the x-ray source (10), which optical mirror comprises a carrier (21) having a minor layer (28) provided on the carrier (21).

Abstract: An apparatus for measurement of the thickness of thin layers by means of X-rays using an X-ray tube which emits X-rays which are directed at a layer to be measured, has at least one aperture apparatus arranged between the X-ray tube and the layer to be measured. The apparatus includes an area absorbing X-rays and an aperture opening. At least one aperture opening in the aperture apparatus has a geometric shape which, seen in the beam direction, projects an area which at least in places is matched to the geometry of the layer to be measured.

Abstract: Apparatus for guiding X-rays from a radiation source to a measurement object (16) having at least two reflecting areas (18) forming a slit.

Abstract: The invention relates to a method of setting a position of an object of measurement in layer thickness measurement by X-ray fluorescence in which a beam of an optical recording device is projected into the beam of the X-radiation and in which the surface of the object of measurement is recorded and output as an image comprising a number of image points, with the distance between the surface and the collimator being changed by an absolute amount of a path of movement, with changes in brightness of the image points being recorded in at least one measuring plane during the at least one change of the distance between the surface and the collimator, with the maximum of the difference in brightness of the image points of an image being ascertained after the at least one change of the absolute amount of the distance, and with the distance between the collimator and the object of measurement being set to the position of the ascertained maximum of the difference in brightness.

Abstract: A specimen part for determining the intensity data of a measuring spot in X-ray fluorescent analysis is characterized in that it has a probe with a clearly defined contour surrounded by a surrounding material, the surrounding material and the probe material having the same linear attenuation coefficients for the emitted X-ray fluorescent radiation. With a method according to the invention it is possible to determine both the intensity centre and the contour of the measuring spot.

Abstract: The invention relates to a method for measuring the thicknesses of thin layers by X-ray fluorescence, in which a specimen having the layer to be studied is positioned in view and subsequently X-radiation is directed onto the layer to be studied and emitted fluorescent radiation is detected by means of a radiation detector and the layer thickness is determined, in which on positioning the specimen there is a focussing by adjusting a focussing element along its optical axis and the position of the focussing element is determined with the layer in focus. An apparatus for layer thickness measurement with X-ray fluorescence according to the invention having a X-ray tube, a detector and an observing device with a focussing element provides for the latter to be movably mounted along its optical axis and provided with a position measuring device.