Patents by Inventor Volley Wang

Volley Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12486473
    Abstract: The invention provides compositions useful in post-CMP cleaning operations where ceria is present. In one aspect, the invention provides a composition comprising a reducing agent; a chelating agent; an amino(C6-C12 alkyl)alcohol; and water; wherein the composition has a pH of less than about 8. The compositions of the invention were found to show improved ceria removal on, for example, poly silicon (poly Si) substrates. Also provided is a method for cleaning a microelectronic device substrate using such compositions and a kit comprising, in one or more containers, selected components of the compositions.
    Type: Grant
    Filed: March 21, 2023
    Date of Patent: December 2, 2025
    Assignee: ENTEGRIS, INC.
    Inventors: Volley Wang, Atanu K. Das, Michael L. White, Chun-I Lee, Nilesh Gunda, Daniela White, Donald Frye
  • Publication number: 20230323248
    Abstract: The invention provides compositions useful in post-CMP cleaning operations where ceria is present. In one aspect, the invention provides a composition comprising a reducing agent; a chelating agent; an amino(C6-C12 alkyl)alcohol; and water; wherein the composition has a pH of less than about 8. The compositions of the invention were found to show improved ceria removal on, for example, poly silicon (poly Si) substrates. Also provided is a method for cleaning a microelectronic device substrate using such compositions and a kit comprising, in one or more containers, selected components of the compositions.
    Type: Application
    Filed: March 21, 2023
    Publication date: October 12, 2023
    Inventors: Volley Wang, Atanu K. Das, Michael L. White, Chun-I Lee, Nilesh Gunda, Daniela White, Donald Frye