Patents by Inventor Volynets VLADMIR

Volynets VLADMIR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of processing a substrate and apparatus for performing the same
    Patent number: 9105581
    Abstract: In a method of processing a substrate, a first plasma may be generated from a first reaction gas. A second plasma may be generated from a second reaction gas. The first plasma and the second plasma may be individually applied to the substrate. Thus, each of the at least two remote plasma sources may generate at least two plasmas under different process recipes, which may be optimized for processing the substrate. As a result, the substrate processed using the optimal plasmas may have a desired shape.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: August 11, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sam Hyung-sam Kim, Gon-Jun Kim, Volynets Vladmir, Yong-Kyun Park, In-Cheol Song, Sang-Heon Lee, Sang-Jean Jeon
  • METHOD OF PROCESSING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME
    Publication number: 20150155178
    Abstract: In a method of processing a substrate, a first plasma may be generated from a first reaction gas. A second plasma may be generated from a second reaction gas. The first plasma and the second plasma may be individually applied to the substrate. Thus, each of the at least two remote plasma sources may generate at least two plasmas under different process recipes, which may be optimized for processing the substrate. As a result, the substrate processed using the optimal plasmas may have a desired shape.
    Type: Application
    Filed: June 5, 2014
    Publication date: June 4, 2015
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sam Hyung-sam KIM, Gon-Jun KIM, Volynets VLADMIR, Yong-Kyun PARK, In-Cheol SONG, Sang-Heon LEE, Sang-Jean JEON