Patents by Inventor Vu NT Nguyen

Vu NT Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overall defect reduction for PECVD films
    Publication number: 20080050932
    Abstract: The present invention generally provides an apparatus and method for reducing defects on films deposited on semiconductor substrates. One embodiment of the present invention provides a method for depositing a film on a substrate. The method comprises treating the substrate with a first plasma configured to reduce pre-existing defects on the substrate, and depositing a film comprising silicon and carbon on the substrate by applying a second plasma generated from at least one precursor and at least one reactant gas.
    Type: Application
    Filed: August 23, 2006
    Publication date: February 28, 2008
    Inventors: Annamalai Lakshmanan, Vu NT Nguyen, Sohyun Park, Ganesh Balasubramanian, Steven Reiter, Tsutomu Kiyohara, Francimar Schmitt, Bok Hoen Kim