Patents by Inventor Vu Quang TRAN

Vu Quang TRAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment sensor apparatus for process sensitivity compensation
    Patent number: 11175593
    Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: November 16, 2021
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Simon Reinald Huisman, Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, Yuxiang Lin, Vu Quang Tran, Sebastianus Adrianus Goorden, Justin Lloyd Kreuzer, Christopher John Mason, Igor Matheus Petronella Aarts, Krishanu Shome, Irit Tzemah
  • Alignment Sensor Apparatus for Process Sensivity Compensation
    Publication number: 20210132509
    Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
    Type: Application
    Filed: April 3, 2019
    Publication date: May 6, 2021
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Simon Reinald HUISMAN, Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY, Yuxiang LIN, Vu Quang TRAN, Sebastianus Adrianus GOORDEN, Justin Lloyd KREUZER, Christopher John MASON, Igor Matheus Petronella AARTS, Krishanu SHOME, Irit TZEMAH