Patents by Inventor Vuong Le
Vuong Le has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230215695Abstract: A RF power generator has a RF power source configured to generate an output signal. A power splitter is configured to receive the output signal and generate a plurality of split signals. A demagnetizing circuit is configured to receive the plurality of split signals. The demagnetizing circuit is configured to include a plurality of inductances corresponding to the plurality of split signals. The plurality of inductances is configured to reduce the effects of mutual impedance of an ICP chamber in series with the plurality of inductances so that a ratio between a pair of the plurality of split signals varies substantially linearly as one of the pair of the plurality of split signals is varied.Type: ApplicationFiled: December 30, 2021Publication date: July 6, 2023Inventors: Dinh-Vuong LE, Jaechul JUNG, Hohyoung LEE, Jeongseok JANG, Ngoc-Hung NGUYEN
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Publication number: 20230050119Abstract: A power supply system includes a RF generator, a matching network, and a control module. The matching network includes at least one mechanically variable impedance element and at least one electrically variable impedance element. The control module is coupled to the matching network and configured to generate one or more signals to adjust at least one of an impedance of the mechanically variable impedance element or an impedance of the electrically variable impedance element to vary an impedance match between the generator and a load. In other examples, a hybrid variable impedance module includes at least one mechanically variable impedance element, at least one electrically variable impedance element, and a control module. The control module is configured to generate one or more signals to adjust at least one of an impedance of the mechanically variable impedance element or an impedance of the electrically variable impedance element.Type: ApplicationFiled: July 26, 2022Publication date: February 16, 2023Inventors: Linnell MARTINEZ, Dinh-Vuong LE, Alexander JURKOV, Jaechul JUNG, Aaron RADOMSKI
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Publication number: 20210330645Abstract: Disclosed herein are antibacterial combinations and compositions that are effective against Gram-negative bacteria. Also disclosed are uses of such combinations and compositions for inhibiting the growth and proliferation of Gram-negative bacteria and/or for killing Gram-negative bacteria and/or for treating a Gram-negative bacterial infection.Type: ApplicationFiled: September 6, 2019Publication date: October 28, 2021Inventors: Jasna Rakonjac, Van Hung Vuong Le, Catrina Olivera, Raveen Weerasinghe, Julian Spagnuolo
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Publication number: 20160095897Abstract: The present invention provides methods and compositions (such as pharmaceutical compositions) comprising PAR4 antagonists for treating or preventing influenza virus type A infections, in particular H1N1 infection. PAR4 antagonists may be combined with a PAR2 agonist or a PAR1 antagonist.Type: ApplicationFiled: April 22, 2014Publication date: April 7, 2016Inventors: Beatrice RITEAU, Ba Vuong LE, Bruno LINA
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Patent number: 9286717Abstract: According to an example, 3D modeling motion parameters may be simultaneously determined for video frames according to different first and second motion estimation techniques. In response to detecting a failure of the first motion estimation technique, the 3D modeling motion parameters determined according to the second motion estimation technique may be used to re-determine the 3D modeling motion parameters according to the first motion estimation technique.Type: GrantFiled: July 30, 2013Date of Patent: March 15, 2016Assignee: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.Inventors: Vuong Le, Wei Hong, Kar-Han Tan, John Apostolopoulos
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Patent number: 9202138Abstract: Various embodiments of methods and apparatus for feature point localization are disclosed. A profile model and a shape model may be applied to an object in an image to determine locations of feature points for each object component. Input may be received to move one of the feature points to a fixed location. Other ones of the feature points may be automatically adjusted to different locations based on the moved feature point.Type: GrantFiled: October 4, 2012Date of Patent: December 1, 2015Assignee: Adobe Systems IncorporatedInventors: Jonathan W. Brandt, Zhe Lin, Vuong Le, Lubomir D. Bourdev
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Patent number: 9158963Abstract: Various embodiments of methods and apparatus for feature point localization are disclosed. An object in an input image may be detected. A profile model may be applied to determine feature point locations for each object component of the detected object. Applying the profile model may include globally optimizing the feature points for each object component to find a global energy minimum. A component-based shape model may be applied to update the respective feature point locations for each object component.Type: GrantFiled: October 4, 2012Date of Patent: October 13, 2015Assignee: Adobe Systems IncorporatedInventors: Jonathan W. Brandt, Zhe Lin, Lubomir D. Bourdev, Vuong Le
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Publication number: 20150035820Abstract: According to an example, 3D modeling motion parameters may be simultaneously determined for video frames according to different first and second motion estimation techniques. In response to detecting a failure of the first motion estimation technique, the 3D modeling motion parameters determined according to the second motion estimation technique may be used to re-determine the 3D modeling motion parameters according to the first motion estimation technique.Type: ApplicationFiled: July 30, 2013Publication date: February 5, 2015Applicant: Hewlett-Packard Development Company, L.P.Inventors: Vuong Le, Wei Hong, Kar-Han Tan, John Apostolopoulos
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Patent number: 8824808Abstract: Various embodiments of methods and apparatus for facial retouching are disclosed. In one embodiment, a face in an input image is detected. One or more transformation parameters for the detected face are estimated based on a profile model. The profile model is applied to obtain a set of feature points for each facial component of the detected face. Global and component-based shape models are applied to generate feature point locations of each facial component of the detected face.Type: GrantFiled: July 31, 2012Date of Patent: September 2, 2014Assignee: Adobe Systems IncorporatedInventors: Jonathan W. Brandt, Zhe Lin, Vuong Le
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Patent number: 8811686Abstract: Various embodiments of methods and apparatus for facial retouching are disclosed. In one embodiment, a face in an input image is detected. Independent sets of feature points are detected for respective facial feature components. A plurality of masks for each of the facial feature components is generated. Using the plurality of masks, retouch effects are performed to the facial feature components. Some embodiments provide for user interaction to constrain the mask generation.Type: GrantFiled: July 31, 2012Date of Patent: August 19, 2014Assignee: Adobe Systems IncorporatedInventors: Jonathan W. Brandt, Zhe Lin, Vuong Le
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Publication number: 20140099031Abstract: Various embodiments of methods and apparatus for feature point localization are disclosed. A profile model and a shape model may be applied to an object in an image to determine locations of feature points for each object component. Input may be received to move one of the feature points to a fixed location. Other ones of the feature points may be automatically adjusted to different locations based on the moved feature point.Type: ApplicationFiled: October 4, 2012Publication date: April 10, 2014Applicant: ADOBE SYSTEMS INCORPORATEDInventors: Jonathan W. Brandt, Zhe Lin, Vuong Le, Lubomir D. Bourdev
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Publication number: 20140098988Abstract: Various embodiments of methods and apparatus for feature point localization are disclosed. An object in an input image may be detected. A profile model may be applied to determine feature point locations for each object component of the detected object. Applying the profile model may include globally optimizing the feature points for each object component to find a global energy minimum. A component-based shape model may be applied to update the respective feature point locations for each object component.Type: ApplicationFiled: October 4, 2012Publication date: April 10, 2014Applicant: ADOBE SYSTEMS INCORPORATEDInventors: Jonathan W. Brandt, Zhe Lin, Lubomir D. Bourdev, Vuong Le
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Publication number: 20130044958Abstract: Various embodiments of methods and apparatus for facial retouching are disclosed. In one embodiment, a face in an input image is detected. One or more transformation parameters for the detected face are estimated based on a profile model. The profile model is applied to obtain a set of feature points for each facial component of the detected face. Global and component-based shape models are applied to generate feature point locations of each facial component of the detected face.Type: ApplicationFiled: July 31, 2012Publication date: February 21, 2013Inventors: Jonathan W. Brandt, Zhe Lin, Vuong Le
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Publication number: 20130044947Abstract: Various embodiments of methods and apparatus for facial retouching are disclosed. In one embodiment, a face in an input image is detected. Independent sets of feature points are detected for respective facial feature components. A plurality of masks for each of the facial feature components is generated. Using the plurality of masks, retouch effects are performed to the facial feature components. Some embodiments provide for user interaction to constrain the mask generation.Type: ApplicationFiled: July 31, 2012Publication date: February 21, 2013Inventors: Jonathan W. Brandt, Zhe Lin, Vuong Le
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Patent number: 7209533Abstract: The present invention prevents the DLL from locking into the wrong phase, harmonic lock and hang. The detection is independent of temperature, voltage and process that the DLL is running. Including these mechanisms in the DLL design, the operating frequency range of the DLL can be extended significantly. Also many design blocks in the main loop can be reused for these additional circuitries, the design time of this DLL is much faster than to design a whole new hang or harmonic lock prevention circuitries.Type: GrantFiled: May 13, 2003Date of Patent: April 24, 2007Assignee: National Semiconductor CorporationInventors: Hai Nguyen, Yu-Sheng (Stephen) Yang, Vuong Le