Abstract: A platform that includes a vibration sensor located within an inner core of a table. The table may have a first plate that supports a vibration-sensitive payload. The first plate may be separated from a second plate by the inner core. The sensor can be located within the core directly below the device. The sensor can be connected to an electrical connector attached to an external surface of the table. A monitor can be readily plugged into the electrical connector to obtain vibration data from the sensor. The platform may also include a damper located within the inner core to reduce vibration of the table. The damper may be an active device that is connected to control circuits located within, or outside, the inner core.

Abstract: A platform that includes a vibration sensor located within an inner core of a table. The table may have a first plate that supports a vibration-sensitive payload. The first plate may be separated from a second plate by the inner core. The sensor can be located within the core directly below the device. The sensor can be connected to an electrical connector attached to an external surface of the table. A monitor can be readily plugged into the electrical connector to obtain vibration data from the sensor. The platform may also include a damper located within the inner core to reduce vibration of the table. The damper may be an active device that is connected to control circuits located within, or outside, the inner core.

Abstract: A platform that includes a vibration sensor located within an inner core of a table. The table may have a first plate that supports a vibration-sensitive payload. The first plate may be separated from a second plate by the inner core. The sensor can be located within the core directly below the device. The sensor can be connected to an electrical connector attached to an external surface of the table. A monitor can be readily plugged into the electrical connector to obtain vibration data from the sensor. The platform may also include a damper located within the inner core to reduce vibration of the table. The damper may be an active device that is connected to control circuits located within, or outside, the inner core.

Abstract: A table assembly that includes a snubber coupled to both a table and a vibration isolator. The snubber limits relative movement between the table and vibration isolator so that the isolator can more quickly damp movement by the table. The snubber reduces the settling time of the table when subjected to shock and/or vibration loads. The snubber may include one or more rollers coupled to an elastomer.

Abstract: A table assembly that includes a snubber coupled to both a table and a vibration isolator. The snubber limits relative movement between the table and vibration isolator so that the isolator can more quickly damp movement by the table. The snubber reduces the settling time of the table when subjected to shock and/or vibration loads.

Abstract: A table that includes a damper attached to a first faceplate and a second faceplate. The damper can dampen flexural loads introduced to the table by either shock or vibration. The damper may include a damping layer that is attached to a first plate and a second plate. The first plate may be cantilevered from the first faceplate. The second plate may be cantilevered from the second faceplate.

Abstract: A table that includes a damper attached to a first faceplate and a second faceplate. The damper can dampen flexural loads introduced to the table by either shock or vibration. The damper may include a damping layer that is attached to a first plate and a second plate. The first plate may be cantilevered from the first faceplate. The second plate may be cantilevered from the second faceplate.

Abstract: A passive vibration isolator that contains a resilient element supported by a first support and a second support. The resilient element reacts with one or more of the supports so that the isolator has a natural frequency versus load curve. The curve has a first portion with a varying natural frequency and a second portion with a relatively constant frequency. The second support may have a profile so that a contact area of the support is approximately constant in the first portion of the curve and varies in the second portion of the curve.