Patents by Inventor W. Benjamin Glenn

W. Benjamin Glenn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Simultaneous cyclical deposition in different processing regions
    Patent number: 6875271
    Abstract: A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.
    Type: Grant
    Filed: April 9, 2002
    Date of Patent: April 5, 2005
    Assignee: Applied Materials, Inc.
    Inventors: W. Benjamin Glenn, Donald J. Verplancken
  • Simultaneous cyclical deposition in different processing regions
    Publication number: 20030190804
    Abstract: A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.
    Type: Application
    Filed: April 9, 2002
    Publication date: October 9, 2003
    Inventors: W. Benjamin Glenn, Donald J. Verplancken