Patents by Inventor W. McGimpsey

W. McGimpsey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070042450
    Abstract: In various aspects are provided a microfluidic and/or nanofluidic sensor that can provide an indication of the reliability of its measurement of the presence of an analyte in a sample under investigation, an analyte concentration in the sample under investigation, or both. The provided sensors, microfluidic devices, and methods of analyte detection, utilize two transduction mechanisms from the same molecule to determine analyte presence, analyte concentration, or both. An analyte sensing molecule is used that can provide both an optical signal and electrochemical signal when an analyte is recognized by an analyte binding portion of the sensing molecule.
    Type: Application
    Filed: April 14, 2006
    Publication date: February 22, 2007
    Applicant: Worcester Polytechnic Institute
    Inventors: W. McGimpsey, Christopher Lambert, John Benco, Venkat Thalladi
  • Publication number: 20050271975
    Abstract: In various aspects, the present invention provides substantially monolayer thick molecular films with photoresponsive wettability, the molecules of said films comprising a photochromic molecule coordinated to a metal atom, which is coordinated to an organic tethering molecule, surface coupling group, or both, having a group for attachment to a surface of a substrate. In various aspects, the present inventions also provide photochromic articles comprising said films, methods of forming said films, and methods of manufacturing photochromic articles using said films. In various embodiments, provided are molecular films where the photoconversion between configurations of the photochromic molecule is substantially reversible by irradiation with light. In various embodiments, provided are films where the photoconversion is substantially irreversible by irradiation with light.
    Type: Application
    Filed: December 15, 2004
    Publication date: December 8, 2005
    Applicant: Worcester Polytechnic Institute
    Inventors: W. McGimpsey, John MacDonald
  • Publication number: 20050202352
    Abstract: Preferred embodiments of the present invention provide methods of forming a photolithographic pattern by patternwise imaging each of two or more different modalities of light onto a multiphoton-specific photoinitiator material to form a photolithographic pattern on the surface where each of the patterns of the two or more different wavelengths of light overlap. In various embodiments, the invention provides a method of semiconductor fabrication capable of permitting the formation of an imaged feature having a dimension smaller than ?/(2 NA), where ? is the smallest wavelength of imaging light, and NA is the numerical aperture of the imaging system.
    Type: Application
    Filed: March 11, 2004
    Publication date: September 15, 2005
    Applicant: Worcester Polytechnic Institute
    Inventors: David Cyganski, W. McGimpsey