Patents by Inventor W. Patrick Rahilly

W. Patrick Rahilly has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4427841
    Abstract: This is an improvement to the AlGaAs/GaAs heteroface solar cell in that the photovoltaically active region is composed of AlGaAs of low Al composition (approximately 2% to 10%) and is bounded by the usual high Al content (approximately 90% or more) AlGaAs window on the cell top and a novel high Al content (more than about 90%) back barrier. The back barrier serves to significantly reduce minority carrier losses in the rear region by blocking the carriers from reaching the cell substrate region. The result is that both light generated current and cell voltage performance will be improved.
    Type: Grant
    Filed: June 29, 1982
    Date of Patent: January 24, 1984
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: W. Patrick Rahilly
  • Patent number: 4400221
    Abstract: Doping with one of the group Ia elements Li, Na or K near the heteroface junction produced P+ conductivity in the gallium arsenide and N+ conductivity in the germanium. The device can be used, for example, as a dual bandgap solar cell. The fabrication includes implanting the group Ia dopant in a Ge wafer. This dopant diffuses into the GaAs when it is subsequently deposited on the Ge.
    Type: Grant
    Filed: October 26, 1982
    Date of Patent: August 23, 1983
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: W. Patrick Rahilly
  • Patent number: 4385198
    Abstract: Doping with one of the Group Ia elements Li, Na or K near the heteroface junction produces P+ conductivity in the gallium arsenide and N+ conductivity in the germanium. The device can be used, for example, as a dual bandgap solar cell. The fabrication includes implanting the Group Ia dopant in a Ge wafer. This dopant diffuses into the GaAs when it is subsequently deposited on the Ge.
    Type: Grant
    Filed: July 8, 1981
    Date of Patent: May 24, 1983
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: W. Patrick Rahilly
  • Patent number: 4094730
    Abstract: A polycrystalline rod of silicon is refined by repeatedly passing it through a zone melt condition, then a dopant impurity is ion implanted in the polycrystalline rod and a seed crystal is attached. A final zone melt pass is then made converting the rod to single crystal structure and distributing the dopant.
    Type: Grant
    Filed: March 11, 1977
    Date of Patent: June 13, 1978
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: W. Patrick Rahilly