Patents by Inventor W. Rader

W. Rader has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing composition
    Publication number: 20050139119
    Abstract: A polishing composition of the present invention includes alumina, colloidal silica, citric acid, an organic acid other than citric acid, an oxidizing agent, and water. When the polishing composition is used in polishing the surface of a substrate for a magnetic disk, the substrate is polished at a high rate, and the substrate after polishing has reduced surface defects.
    Type: Application
    Filed: December 24, 2003
    Publication date: June 30, 2005
    Inventors: W. Rader, Jie Lin