Patents by Inventor W. Slafer

W. Slafer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080311235
    Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrode-position cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
    Type: Application
    Filed: January 20, 2006
    Publication date: December 18, 2008
    Inventor: Dennis W. Slafer
  • Publication number: 20080024902
    Abstract: Techniques, methods, systems, and apparatus are disclosed that are useful for creating addressable three-dimensional elements formed on a flexible substrate using continuous roll-to-roll fabrication methods. An array of conductive elements can be formed on a first flexible substrate layer, over which is disposed a second polymer layer containing a three-dimensional micro-scale relief pattern. The second layer can be formed in registration with the underlying electrode pattern. The lowest areas of the micropattern can be etched away, in order to expose the underlying electrode elements. The 3D micropattern can include a volumetric structure capable of being filled with various materials, where the contents of the 3D structure may be further processed by chemical, electrochemical, or physical treatment. The 3D structure may consist of elements in the general form of microvessels disposed in a periodic or non-periodic array.
    Type: Application
    Filed: July 30, 2007
    Publication date: January 31, 2008
    Inventor: W. Slafer
  • Publication number: 20070118679
    Abstract: A pre-formatted optical data storage tape (10) including an elongated linear polymer layer having at least one pattern of optically readable embossments (114) on at least one surface of the polymer layer, and an optical recording layer covering the pattern of optically readable embossments (114) of the elongated linear polymer layer, wherein the optical recording layer is adapted such that recorded marks (120) may be made in the recording layer by directing a focused source of energy into the recording layer.
    Type: Application
    Filed: January 21, 2005
    Publication date: May 24, 2007
    Inventors: W. Slafer, Matthew White, Milford Kime, Timothy Frey
  • Publication number: 20060283539
    Abstract: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions including the range from tens of Angstroms to greater than 10,000 Angstroms. The substrate may be any material capable of sufficient flexibility for compatibility with roll-based processing equipment, including polymeric films, metallic foils, and thin glass, with polymeric films representing a particularly broad field of application. Methods may include the continuous roll-to-roll formation of a temporary polymeric structure with selected areas open to the underlying substrate, the continuous addition or subtraction of constituent materials, and the continuous removal, where necessary, of the polymeric structure and any excess material.
    Type: Application
    Filed: June 20, 2006
    Publication date: December 21, 2006
    Inventor: W. Slafer
  • Publication number: 20060194448
    Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
    Type: Application
    Filed: January 20, 2006
    Publication date: August 31, 2006
    Inventor: W. Slafer