Abstract: A system and method for cleaning components of one or more water retaining devices, such as hydro-massage tubs or pools, includes two pumps, a tank, one or more supply valves, and control circuitry. The pumps control the flow of a concentrated cleaning agent and water to the tank. The tank stores the cleaning agent and water as a diluted cleaning solution at a desired pressure, and selectively dispenses the diluted solution to the water retaining device(s) through appropriate piping. The supply valve(s) controls the flow of cleaning solution to the components (e.g., air and/or water subsystem components) of the water retaining device(s). The control circuitry controls the operation of the pumps and preferably the supply valve(s) in accordance with a predetermined cleaning procedure. The system may optionally include one or more outflow devices to stop the cleaning solution from prematurely exiting the components of the water retaining device(s).

Abstract: A system for cleaning components of one or more water retaining devices (e.g., tubs) includes two pumps, a tank, one or more supply valves, a water retaining device, and control circuitry. The pumps control the flow of a concentrated cleaning agent and water to the tank. The tank stores the cleaning agent and water as a diluted cleaning solution at a desired pressure, and selectively dispenses the diluted solution to the tub(s) through appropriate piping. The supply valve(s) controls the flow of cleaning solution to components of the tub. The tub includes a water propulsion device (e.g., jet) configured to facilitate efficient cleaning of the propulsion device's various surfaces. The control circuitry controls the operation of the pumps and preferably the supply valve(s) in accordance with a predetermined cleaning procedure. The system may optionally include an outflow device to prevent premature evacuation of the cleaning solution from the tub's components.