Abstract: A liquid immersion lithography apparatus includes a projection system having an optical member of which an incidence side has a convex lens shape, and a flow passage connected to a hole from which liquid is supplied. A substrate is exposed through the liquid covering only a portion of an upper surface of the substrate. The optical member has an end surface via which the exposure light is projected to the substrate via the liquid. A material having the end surface is fused silica.

Abstract: An immersion lithography apparatus includes a projection system having a last optical element, a plurality of liquid supply openings that surround a path of exposure light that exits an end surface of the last optical element and face downwardly, and a plurality of liquid recovery openings that surround the path of the exposure light, are arranged radially outward of the liquid supply openings, and face downwardly. An upper surface of a substrate is opposite to the liquid supply openings and the liquid recovery openings. A portion of the upper surface of the substrate is covered with immersion liquid, which flows across the end surface of the last optical element. The substrate is exposed with the exposure light through the immersion liquid between the end surface of the last optical element and the upper surface the substrate.

Abstract: An immersion lithography apparatus includes: an optical assembly including a plano-convex lens as a last optical element, the optical assembly configured to project an image onto a substrate through an immersion liquid; a containment member that surrounds a last portion of the optical assembly, the containment member having a channel via which the immersion liquid recovered from a gap between the containment member and the substrate and/or a stage holding the substrate is removed; an outlet above a bottom surface of the last optical element, via which the immersion liquid is released to a space between the optical assembly and the containment member; and an immersion liquid source apparatus from which the immersion liquid is delivered to the outlet, the immersion liquid source apparatus having a flow controller, and a flow sensor that measures a rate of a flow of the immersion liquid to be delivered to the outlet.

Abstract: An immersion lithography apparatus includes an optical assembly including an optical element, and configured to project a beam onto a substrate through immersion liquid, a containment member surrounding a path of the beam, a stage on which the substrate is held and moved below a bottom surface of the containment member with the substrate spaced from the bottom surface of the containment member, and a support system having an actuator to support and move the containment member. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap, the second supply opening being provided radially inward of the recovery opening.

Abstract: An immersion lithography apparatus includes a projection system having a last optical element, a plurality of liquid supply openings that surround a path of exposure light that exits an end surface of the last optical element and face downwardly, and a plurality of liquid recovery openings that surround the path of the exposure light, are arranged radially outward of the liquid supply openings, and face downwardly. An upper surface of a substrate is opposite to the liquid supply openings and the liquid recovery openings. A portion of the upper surface of the substrate is covered with immersion liquid, which flows across the end surface of the last optical element. The substrate is exposed with the exposure light through the immersion liquid between the end surface of the last optical element and the upper surface the substrate.

Abstract: A liquid immersion lithography apparatus includes a projection system including an optical member of which an incidence side has a convex lens shape, the projection system being configured to project an image through a liquid on a workpiece, and a liquid immersion member arranged below the optical member, the liquid immersion member having a plurality of openings through which the liquid is allowed to flow. A material of which the optical member is made is more resistant to the liquid than a material of which the liquid immersion member is made.

Abstract: An immersion lithography apparatus includes an optical assembly including an optical element, and configured to project a beam onto a substrate through immersion liquid, a containment member surrounding a path of the beam, a stage on which the substrate is held and moved below a bottom surface of the containment member with the substrate spaced from the bottom surface of the containment member, and a support system having an actuator to support and move the containment member. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap, the second supply opening being provided radially inward of the recovery opening.

Abstract: An immersion lithography apparatus includes an optical assembly that projects a beam onto a substrate through an immersion liquid, a containment member surrounding a path of the beam, a stage holding the substrate, an isolator having a first actuator which limits vibrations of the optical assembly, and a support system having a second actuator to support the containment member and move it by the second actuator. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.

Abstract: Boresight and other pointing errors are detected based on a monitor beam formed by diverting a portion of a probe beam. The monitor beam is directed to a position sensitive photodetector, and the optical power received at the position sensitive photodetector is used to estimate or correct such pointing errors.

Abstract: A liquid immersion lithography apparatus includes a projection system including an optical member of which an incidence side has a convex lens shape, the projection system being configured to project an image through a liquid on a workpiece, and a liquid immersion member arranged below the optical member, the liquid immersion member having a plurality of openings through which the liquid is allowed to flow. A material of which the optical member is made is more resistant to the liquid than a material of which the liquid immersion member is made.

Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

Abstract: An immersion lithography apparatus includes an optical assembly that projects a beam onto a substrate through an immersion liquid, a containment member surrounding a path of the beam, a stage holding the substrate, an isolator having a first actuator which limits vibrations of the optical assembly, and a support system having a second actuator to support the containment member and move it by the second actuator. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.

Abstract: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

Abstract: A lithographic projection apparatus includes a projection optics having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid covering a portion of the upper surface. The last element has a convex-shape incident surface, an exit surface from which the exposure light is emitted, and an outer surface arranged above the exit surface. The outer surface of the last element has a lower portion, and extends radially-outwardly and upwardly from the lower portion. The apparatus also includes a gap along the outer surface of the last element, the gap being defined between the outer surface of the last element and an opposing surface.

Abstract: An exposure apparatus exposes a substrate with light from an object through an optical assembly and liquid. The exposure apparatus includes a stage and a liquid supply system. The stage is movable relative to the optical assembly and holds the substrate so that the substrate faces the optical assembly across the liquid. The liquid supply system includes an outlet arranged so as to face a top surface of the substrate held by the stage and supplies the liquid from the outlet onto the top surface. The stage includes a support which supports an undersurface of the substrate, and a channel having a port. The port is arranged outside the support so as to recover the liquid supplied from the outlet and flowing outwardly from the top surface of the substrate supported by the support.

Abstract: A system for providing an adjusted image of a scene includes an optical assembly, a capturing system coupled to the optical assembly, and a control system. The optical assembly is adjustable to alternatively be focused on a first focal area and a second focal area that is different than the first focal area. The capturing system captures a first frame of the scene when the optical assembly is focused at the first focal area, and a second frame of the scene when the optical assembly is focused at the second focal area. The first frame includes a plurality of first pixels and the second frame includes a plurality of second pixels. The control system analyzes the first frame and the second frame and utilizes graph cuts techniques to assign a depth label to at least a portion of the first frame.

Abstract: A lithographic projection apparatus includes a projection optics having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid covering a portion of the upper surface. The last element has a convex-shape incident surface, an exit surface from which the exposure light is emitted, and an outer surface arranged above the exit surface. The outer surface of the last element has a lower portion, and extends radially-outwardly and upwardly from the lower portion. The apparatus also includes a gap along the outer surface of the last element, the gap being defined between the outer surface of the last element and an opposing surface.

Abstract: An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.

Abstract: A stage assembly that moves a device includes a stage that retains the device, a stage mover that moves the stage, a measurement system that provides a measurement signal that relates to the position or movement of the stage, and a control system that control the stage mover. The control system can use an estimator to estimate the position of the stage in the event the measurement signal is lost. Alternatively, the control system can be used to urge the stage against a base assembly when the measurement signal is lost to inhibit the movement of the stage.

Abstract: A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure light is emitted. The last element also has an outer surface which extends upwardly from an edge portion of the lower surface. The apparatus also includes a space along the outer surface of the last element, to which the liquid is supplied from above the lower surface of the last element. The space is defined by the outer surface of the last element and a surface opposing the outer surface of the last element.