Abstract: Systems and methods for generating an optical image include forming an optical image with at least one optical element of an optical imager while modifying wavefront phase. Modifying the phase does not reduce an optical bandpass limited by an aperture of the optical imager. The systems and methods also include detecting the optical image over a range of spatial frequencies such that there are no zeros in an optical transfer function of the optical imager over detected spatial frequencies within the optical bandpass and over an extended depth of focus that is larger than a depth of focus occurring without modifying wavefront phase.

Abstract: An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

Abstract: An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

Abstract: An imaging system is characterized at least by an ambiguity function (“AF”) and a point spread function (“PSF”). The AF is a function of parameters u and v related to a misfocus parameter ?; the PSF is at least a function of ?. The system includes (1) an image recording device, (2) an optical arrangement for imaging an object to the image recording device, and (3) a post processor that renders an in-focus electronic image over a range of distances between the object and the optical arrangement. The optical arrangement alters phase such that a main lobe of the AF is broader in v for a specific u. The PSF has a functionally different form for a specific ?, in comparison to a PSF characterizing the system when the optical arrangement does not alter the phase for those specific values of u and ? over the range of distances.

Abstract: A system for forming an image includes a lens and a phase mask. The image is characterized by an optical transfer function that has no zeros within detected spatial frequencies of a detector that detects the optical image over a larger depth of focus than without the phase mask. The phase mask does not reduce an optical bandpass limited by an aperture of the lens or of the phase mask. A method for generating an optical image includes forming the image with at least one element of an imaging system while modifying wavefront phase without reducing an optical bandpass limited by an aperture of the imaging system. The method also includes detecting the optical image without introducing zeros in an optical transfer function of the imaging system, over detected spatial frequencies within the optical bandpass over an extended depth of focus.

Abstract: A system for increasing the depth of field and decreasing the wavelength sensitivity and the effects of misfocus-producing aberrations of the lens of an incoherent optical system incorporates a special purpose optical mask into the incoherent system. The optical mask has been designed to cause the optical transfer function to remain essentially constant within some range from the in-focus position. Signal processing of the resulting intermediate image undoes the optical transfer modifying effects of the mask, resulting in an in-focus image over an increased depth of field. Generally the mask is placed at a principal plane or the image of a principal plane of the optical system. Preferably, the mask modifies only phase and not amplitude of light. The mask may be used to increase the useful range of passive ranging systems.

Abstract: An imaging system is characterized at least by an ambiguity function (“AF”) and a point spread function (“PSF”). The AF is a function of parameters u and v related to a misfocus parameter ?; the PSF is at least a function of ?. The system includes (1) an image recording device, (2) an optical arrangement for imaging an object to the image recording device, and (3) a post processor that renders an in-focus electronic image over a range of distances between the object and the optical arrangement. The optical arrangement alters phase such that a main lobe of the AF is broader in v for a specific u. The PSF has a functionally different form for a specific ?, in comparison to a PSF characterizing the system when the optical arrangement does not alter the phase for those specific values of u and ? over the range of distances.

Abstract: A system for increasing the depth of field and decreasing the wavelength sensitivity of an incoherent optical system incorporates a special purpose optical mask into the incoherent system. The optical mask has been designed to cause the optical transfer function to remain essentially constant within some range from the in-focus position. Signal processing of the resulting intermediate image undoes the optical transfer modifying effects of the mask, resulting in an in-focus image over an increased depth of field. Generally the mask is placed at or near an aperture stop or image of the aperture stop of the optical system. Preferably, the mask modifies only phase and not amplitude of light, though amplitude may be changed by associated filters or the like. The mask may be used to increase the useful range of passive ranging systems.

Abstract: An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

Abstract: An imaging system for imaging an object onto an image plane. An optical arrangement forms an intermediate image of the object at an intermediate plane with a first value of axial resolution. The imaging system also includes a digital processor configured to process the intermediate image to form a final image of the object. The imaging system further includes a specially designed optical element that cooperates with the optical arrangement and the digital processor to define a second value of axial resolution that is greater than the first value.

Abstract: The present invention provides extended depth of field to human eyes by modifying contact lenses, intraocular implants, and/or the surface of the eye itself. This may be accomplished by applying selected phase variations to these optical elements (e.g., by varying surface thickness of the cornea of the eye). The phase variations EDF-code the wavefront and cause the optical transfer function to remain essentially constant within a range of distances from the in-focus position. This provides a coded image on the retina. The human brain decodes this coded image, resulting in an in-focus image over an increased depth of field.

Abstract: An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

Abstract: Systems and methods reduce aberrations in a wavefront imaged by an optical system having a non-linear detector. A wavefront of electromagnetic radiation from an object imaged to the non-linear detector is encoded. Data from the non-linear detector is digitally converted to form a digital representation of the image captured by the non-linear detector. The detected image is linearized to form a linearized image. The linearized image is filtered to reverse effects of wavefront coding to form a final image.

Abstract: A system for increasing the depth of field and decreasing the wavelength sensitivity and the effects of misfocus-producing aberrations of the lens of an incoherent optical system incorporates a special purpose optical mask into the incoherent system. The optical mask has been designed to cause the optical transfer function to remain essentially constant within some range from the in-focus position. Signal processing of the resulting intermediate image undoes the optical transfer modifying effects of the mask, resulting in an in-focus image over an increased depth of field. Generally the mask is placed at a principal plane or the image of a principal plane of the optical system. Preferably, the mask modifies only phase and not amplitude of light. The mask may be used to increase the useful range of passive ranging systems.

Abstract: The present invention provides extended depth of field to human eyes by modifying contact lenses, intraocular implants, and/or the surface of the eye itself. This may be accomplished by applying selected phase variations to these optical elements (e.g., by varying surface thickness of the cornea of the eye). The phase variations EDF-code the wavefront and cause the optical transfer function to remain essentially constant within a range of distances from the in-focus position. This provides a coded image on the retina. The human brain decodes this coded image, resulting in an in-focus image over an increased depth of field.

Abstract: An improved confocal microscope utilizes an array of light sources imaged onto an object, and an array of small detectors to detect the light from each source. Cross talk between the beams of light is prevented by temporally modulating the sources at different frequencies. Light from one source is temporally modulated at a first frequency, for example in the megahertz region. A reference signal at the same frequency plus an offset frequency is also sent to the detector assigned to that source. The detected signal and the reference signal are then beat together, and heterodyne detection is used to detect only the light from the assigned source, which will beat with the reference signal and produce a signal at the offset frequency. Light from other sources beat with the reference signal to produce different frequency beat signals, which are filtered out using bandpass filters.

Abstract: The present invention provides extended depth of focus (EDF) to human eyes by modifying contact lenses, interocular implants, or the surface of the eye itself. This is accomplished by applying selected phase variations to the optical element in question (for example, by varying surface thickness). The phase variations EDF-code the wavefront and cause the optical transfer function to remain essentially constant within some range away from the in-focus position. This provides a coded image on the retina. The human brain decodes this coded image, resulting in an in-focus image over an increased depth of focus.

Abstract: An improved confocal microscope utilizes an array of light sources imaged onto an object, and an array of small detectors to detect the light from each source. Cross talk between the beams of light is prevented by temporally modulating the sources at different frequencies. Light from one source is temporally modulated at a first frequency, for example in the megahertz region. A reference signal at the same frequency plus an offset frequency is also sent to the detector assigned to that source. The detected signal and the reference signal are then beat together, and heterodyne detection is used to detect only the light from the assigned source, which will beat with the reference signal and produce a signal at the offset frequency. Light from other sources beat with the reference signal to produce different frequency beat signals, which are filtered out using bandpass filters.

Abstract: Apparatus for increasing color resolution and quality in digital imaging systems temporally modulates red, green and blue light, detects all three colors at each pixel, and band pass filters the detected light to extract values for red, green and blue at each pixel. A detector which preserves the modulation, such as a complementary metal oxide semiconductor detector is used. Alternatively, if an integrating detector array such as a charge coupled device (CCD) is used, the three illumination sources are switched on and off sequentially, and the detector array switches to different integrating circuits for each color. Measurement of the range provides full color, three-dimensional, image data.

Abstract: An optical system for providing an in-focus, extended depth of field image on a projection surface includes an encoded mask or light encoder for preceding the light to include object information (or, equivalently, information about the desired image), and an extended depth of field (EDF) mask, for extending the depth of field of the projection system. In addition to including object information, the encoded mask encodes the light from the light source to account for the variations introduced by the EDF mask in extending the depth of field, so that no post processing is required.