Patents by Inventor Wah Lawrence NG

Wah Lawrence NG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10094015
    Abstract: A method for making a magnetic recording medium, including providing a substrate, forming a magnetic layer on the substrate, applying filtered cathodic vacuum arc (FCVA) deposition to form a film on the magnetic layer, and performing nitridation on the film formed by the FCVA deposition.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: October 9, 2018
    Assignee: FUJI ELECTRIC (MALAYSIA) SDN, BHD.
    Inventors: Wah Lawrence Ng, Se Yong Eh Noum, Mun Sing Fan, Wee Shen Khoo, Naruhisa Nagata
  • Publication number: 20170186457
    Abstract: A graphene layer, used as an anti-corrosive protection medium for magnetic media, overcomes the existing problem of reducing the carbon overcoat layer thickness for magnetic media. Unlike the amorphous carbon that is currently used as an anti-corrosion layer, the impenetrability of graphene to all known gaseous substances enables full corrosion protection of the underlying magnetic medium with a layer of graphene that may be, for example, as thin as a single layer of graphene. The dry transfer of graphene onto magnetic recording disks is enabled, such that the resulting interface of the graphene with the magnetic layer is protested from contact with impurities.
    Type: Application
    Filed: April 7, 2015
    Publication date: June 29, 2017
    Inventors: Wah Lawrence Ng, Andreas Volker Stier, Iñigo Martin Fernandez, Barbaros Özyilmaz, Antonio Helio Castro Neto
  • Publication number: 20150275352
    Abstract: A method for making a magnetic recording medium, including providing a substrate, forming a magnetic layer on the substrate, applying filtered cathodic vacuum arc (FCVA) deposition to form a film on the magnetic layer, and performing nitridation on the film formed by the FCVA deposition.
    Type: Application
    Filed: July 14, 2014
    Publication date: October 1, 2015
    Applicant: FUJI ELECTRIC (MALAYSIA) SDN, BHD.
    Inventors: Wah Lawrence NG, Se Yong EH NOUM, Mun Sing FAN, Wee Shen KHOO, Naruhisa NAGATA