Patents by Inventor Wakahiko Sakata

Wakahiko Sakata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6821683
    Abstract: A method for correcting design pattern data of a semiconductor circuit in which, in the middle of miniaturization and high density of a mask pattern being developed, a technique of correction is applied at a practical level in which the correction of design pattern data in the formation of fine patterns on a semiconductor wafer is associated with the correction of design patterns in the fabrication of a photomask.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: November 23, 2004
    Assignee: Dainippon Printing Co., Ltd.
    Inventors: Nobuhito Toyama, Naoki Shimohakamada, Wakahiko Sakata
  • Patent number: 6560767
    Abstract: A process for making photomask pattern data comprises the steps of: (a) a first step for fetching original data of design data as digital data; (b) a second step for extracting the information on distortion (deformation) of formed pattern of from the original figure data when producing a photomask using the original figure data; (c) a third step for extracting the information on the information on distortion (deformation) of formed pattern when producing a pattern on a wafer using the photomask; (d) a fourth step for obtaining the information for determining parts to be corrected and the amount of correction by combining the information obtained in the second step and the information obtained in the third step; and (e) a fifth step for generating the correction figure for correction applied to the original figure data of design data, on the basis of the information obtained in the fourth step, so that correction pattern data is obtained.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: May 6, 2003
    Assignee: Dainippon Printing Co., Ltd.
    Inventors: Nobuhito Toyama, Naoki Shimohakamada, Wakahiko Sakata
  • Publication number: 20020110742
    Abstract: A method for correcting design pattern data of a semiconductor circuit in which, in the middle of miniaturization and high density of a mask pattern being developed, a technique of correction is applied at a practical level in which the correction of design pattern data in the formation of fine patterns on a semiconductor wafer is associated with the correction of design patterns in the fabrication of a photomask.
    Type: Application
    Filed: September 24, 2001
    Publication date: August 15, 2002
    Inventors: Nobuhito Toyama, Naoki Shimohakamada, Wakahiko Sakata
  • Publication number: 20020028523
    Abstract: A process for making photomask pattern data comprises the steps of: (a) a first step for fetching original data of design data as digital data; (b) a second step for extracting the information on distortion (deformation) of formed pattern of from the original figure data when producing a photomask using the original figure data; (c) a third step for extracting the information on the information on distortion (deformation) of formed pattern when producing a pattern on a wafer using the photomask; (d) a fourth step for obtaining the information for determining parts to be corrected and the amount of correction by combining the information obtained in the second step and the information obtained in the third step; and (e) a fifth step for generating the correction figure for correction applied to the original figure data of design data, on the basis of the information obtained in the fourth step, so that correction pattern data is obtained.
    Type: Application
    Filed: May 14, 2001
    Publication date: March 7, 2002
    Inventors: Nobuhito Toyama, Naoki Shimohakamada, Wakahiko Sakata