Patents by Inventor Waldemar Gotze

Waldemar Gotze has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a mask for radiation lithography
    Patent number: 4946751
    Abstract: A method is set forth of manufacturing a mask for radiation lithography having a mask support and a substrate, on which an absorber layer is provided to be structured according to a desired mask pattern. The absorber layer having a thickness preferably in the range of from 0.2 to 1.2 .mu.m of partly oxidized tungsten having an oxygen content in the range of from 21 to 29 at. % in the layer is deposited on the substrate, preferably by means of cathode sputtering.
    Type: Grant
    Filed: August 31, 1988
    Date of Patent: August 7, 1990
    Assignee: U.S. Philips Corporation
    Inventors: Angelika Bruns, Waldemar Gotze, Margret Harms, Holger Luthje
  • Method of and device for providing thin layers by cathode sputtering
    Patent number: 4049523
    Abstract: A mould and supporting dish for dry-compressed powder targets which are constructed so that adsorbed residual gases can readily escape during the evacuation process of the cathode sputtering device via substantially all the surfaces of the powder target, so that the powder target is not torn or its structure damaged during the evacuation process. The adsorbed residual gases can escape through apertures in the bottom and side wall of the supporting dish.
    Type: Grant
    Filed: June 10, 1976
    Date of Patent: September 20, 1977
    Assignee: U.S. Philips Corporation
    Inventors: Ralf-Dieter Boehnke, Waldemar Gotze