Patents by Inventor Waldemar Kocon

Waldemar Kocon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polycide etching with HCL and chlorine
    Patent number: 5874363
    Abstract: Metal silicide is removed at a faster rate than polysilicon in dry etching of metal silicide/polysilicon composites with an etching gas made from HCl and Cl.sub.2 at a volumetric flowrate ratio of HCl:Cl.sub.2 within the range of 3:1 to 5:1.
    Type: Grant
    Filed: May 13, 1996
    Date of Patent: February 23, 1999
    Assignees: Kabushiki Kaisha Toshiba, International Business Machines Corporation, Siemens Components, Inc.
    Inventors: Peter D. Hoh, Tokuhisa Ohiwa, Virinder Grewal, Bruno Spuler, Waldemar Kocon, Guadalupe Wiltshire