Patents by Inventor Wallace O'Neil Parker

Wallace O'Neil Parker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8110692
    Abstract: The present invention relates to new organic-inorganic hybrid silicates and metal-silicates called ECS, characterized by an X-ray powder diffraction pattern with reflections exclusively at angular values higher than 4.0° of 2?, preferably at angular values higher than 4.7°, and an ordered structure containing structural units having formula (a) wherein R is an organic group: Formula (a) and possibly containing one or more elements T selected from groups III B, IV B, V B and transition metals, with a Si/(Si +T) molar ratio in said structure higher than 0.3 and lower than or equal to 1, wherein Si is the silicon contained in the structural unit (a). A process is also described, starting from disilanes, for the preparation of these materials, which does not include the use of templates or surfactants. These materials can be used as molecular sieves, adsorbents, in the field of catalysis, in the field of electronics, in the field of sensors, in the field of nanotechnologies.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: February 7, 2012
    Assignee: ENI S.p.A.
    Inventors: Giuseppe Bellussi, Angela Carati, Caterina Rizzo, Urbano Diaz Morales, Stefano Zanardi, Wallace O'Neil Parker, Roberto Millini
  • Publication number: 20100191009
    Abstract: The present invention relates to new organic-inorganic hybrid silicates and metal-silicates called ECS, characterized by an X-ray powder diffraction pattern with reflections exclusively at angular values higher than 4.0° of 2?, preferably at angular values higher than 4.7°, and an ordered structure containing structural units having formula (a) wherein R is an organic group: Formula (a) and possibly containing one or more elements T selected from groups III B, IV B, V B and transition metals, with a Si/(Si+T) molar ratio in said structure higher than 0.3 and lower than or equal to 1, wherein Si is the silicon contained in the structural unit (a). A process is also described, starting from disilanes, for the preparation of these materials, which does not include the use of templates or surfactants. These materials can be used as molecular sieves, adsorbents, in the field of catalysis, in the field of electronics, in the field of sensors, in the field of nanotechnologies.
    Type: Application
    Filed: August 3, 2007
    Publication date: July 29, 2010
    Applicant: ENI S.P.A.
    Inventors: Giuseppe Bellussi, Angela Carati, Caterina Rizzo, Urbano Diaz Morales, Stefano Zanardi, Wallace O'Neil Parker, Roberto Millini